Patent Ranking in Japan - Applicant details - Japanese version

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JX Nippon Mining & Metals Co., Ltd.

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　■　2016 Application Ranking      175th 　publications: 251 （下降2015: 156th  297）

　■　2016 Acquisition Ranking      141th 　registrations: 251 （上昇2015: 184th  166）

（update：Jul 29, 2021）

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Publication numberTitle of the InventionPublic. dateRemarks
B 6053977 Cylindrical sputtering target Dec 27, 2016
B 6047466 Copper alloy plate with excellent conductivity and flexural deflection coefficient Dec 21, 2016
B 6050403 Positive electrode active material for lithium ion battery, positive electrode for lithium ion battery, and lithium ion battery Dec 21, 2016
B 6050485 Method for producing high-purity manganese and high-purity manganese Dec 21, 2016
B 6050664 Metal material for electronic parts, method for manufacturing the same, connector terminal using the same, connector and electronic parts Dec 21, 2016
B 6050738 Copper alloy plate with excellent conductivity, formability and stress relaxation characteristics Dec 21, 2016
B 6041779 Copper alloy foil Dec 14, 2016
B 6046082 Method for treating copper-containing molybdenum ore Dec 14, 2016
B 6037415 Magnetic material sputtering target and manufacturing method thereof Dec 7, 2016
B 6037420 Cobalt sputtering target Dec 7, 2016
B 6037421 Sb-Te based alloy sintered body sputtering target Dec 7, 2016
B 6037422 Method for manufacturing sputtering target made of Ni-P alloy or Ni-Pt-P alloy Dec 7, 2016
B 6037813 Rolled copper foil for producing multilayer graphene and method for producing multilayer graphene Dec 7, 2016
B 6038192 Leaching method of gold from gold ore containing pyrite Dec 7, 2016
B 6038279 Gold and silver elution method and gold and silver recovery method using the same Dec 7, 2016

1-15 (total:252)

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6053977 6047466 6050403 6050485 6050664 6050738 6041779 6046082 6037415 6037420 6037421 6037422 6037813 6038192 6038279

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Patent Ranking in Japan

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