Patent Ranking in Japan - Applicant details - Japanese version

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JX Nippon Mining & Metals Co., Ltd.

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  2020 Application Ranking      211th  publications: 202 上昇2019: 245th  178)

  2020 Acquisition Ranking      231th  registrations: 124 下降2019: 177th  157)

(update:Nov 25, 2021)

2011  2012  2013  2014  2015  2016  2017  2018  2019  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6724057 Sputtering target material Jul 15, 2020
B 6724266 Potassium sodium niobate sputtering target and manufacturing method thereof Jul 15, 2020
B 6725212 CdTe compound semiconductor and radiation detection element using the same Jul 15, 2020
B 6719499 Punch structure of press die, press die, method for manufacturing press-formed product, and press-formed product Jul 8, 2020
B 6719630 Sputtering target manufacturing method Jul 8, 2020
B 6720087 Copper alloy sputtering target and manufacturing method thereof Jul 8, 2020
B 6720222 High-purity tungsten pentachloride and its synthesis method Jul 8, 2020
B 6717625 Systems and methods for parallel and automatic measurement of fluoride ion and mercury concentrations in water Jul 1, 2020
B 6712561 Rolled copper foil for flexible printed circuit boards, copper-clad laminates using it, flexible printed circuit boards, and electronic devices. Jun 24, 2020
B 6712620 Semiconductor device Jun 24, 2020
B 6713341 Compound semiconductor substrate and its manufacturing method Jun 24, 2020
B 6713430 Operation method of vertical crusher Jun 24, 2020
B 6713489 Sputtering target for magnetic recording medium and magnetic thin film Jun 24, 2020
B 6707426 Sb removal method Jun 10, 2020
B 6708468 Lithium-ion battery processing method Jun 10, 2020

61-75 (total:127)

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6724057 6724266 6725212 6719499 6719630 6720087 6720222 6717625 6712561 6712620 6713341 6713430 6713489 6707426 6708468

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Patent Ranking in Japan

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東京都新宿区新宿5-10-1 第2スカイビル6階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング