Patent Ranking in Japan - Applicant details - Japanese version

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ULVAC, Inc.

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  2015 Application Ranking      400th  publications: 88 下降2014: 254th  168)

  2015 Acquisition Ranking      166th  registrations: 188 上昇2014: 185th  238)

(update:Jan 11, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
2013-150804 Dry etching method Dec 17, 2015
2013-146763 Articulated robot, carrier Dec 14, 2015
A 2015-224607 Discharge device Dec 14, 2015
A 2015-221414 Discharge device Dec 10, 2015
A 2015-219196 Radiation image conversion panel manufacturing method and radiation image conversion panel Dec 7, 2015
A 2015-220414 Recess forming method and heat treatment furnace Dec 7, 2015
A 2015-216241 Functional element, vanadium dioxide thin film manufacturing method Dec 3, 2015
A 2015-216364 Holding device, vacuum processing device Dec 3, 2015
A 2015-195388 Method for calculating parameter of photonic crystal periodic structure, program, and recording medium Nov 5, 2015
A 2015-192102 Reactive ion etching system Nov 2, 2015
A 2015-184058 Hot cathode ionization vacuum gauge Oct 22, 2015
A 2015-180959 Color filter manufacturing method, color filter, and reflective display device Oct 15, 2015
A 2015-178653 Sputtering apparatus and sputtering method Oct 8, 2015
A 2015-178682 Reactive sputtering equipment Oct 8, 2015
A 2015-176909 Substrate adsorption/desorption mechanism, substrate transfer device, and vacuum device Oct 5, 2015

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2013-150804 2013-146763 2015-224607 2015-221414 2015-219196 2015-220414 2015-216241 2015-216364 2015-195388 2015-192102 2015-184058 2015-180959 2015-178653 2015-178682 2015-176909

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