Patent Ranking in Japan - Applicant details - Japanese version

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ULVAC, Inc.

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  2016 Application Ranking      499th  publications: 67 下降2015: 400th  88)

  2016 Acquisition Ranking      236th  registrations: 145 下降2015: 166th  188)

(update:Jan 11, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
A 2016-216764 Cathode unit for magnetron sputtering equipment and sputtering method using this cathode unit Dec 22, 2016
A 2016-218050 Pirani vacuum gauge Dec 22, 2016
A 2016-219186 Positive electrode active material film and film formation method Dec 22, 2016
A 2016-219450 Substrate processing equipment Dec 22, 2016
A 2016-219503 Semiconductor devices, their manufacturing methods, and mounting devices Dec 22, 2016
A 2016-211040 Target assembly, sputtering equipment, and method for determining the usage limit of the target material Dec 15, 2016
A 2016-211061 Sheet-shaped mask Dec 15, 2016
A 2016-211063 Sputtering method and sputtering equipment Dec 15, 2016
A 2016-177870 Ion beam device, ion implantation device, ion beam emission method Oct 6, 2016
A 2016-161450 Cold cathode ionization vacuum gauge Sep 5, 2016
A 2016-162370 Touch panel and transparent conductive substrate Sep 5, 2016
A 2016-156731 Septal vacuum gauge and manufacturing method of diaphragm vacuum gauge Sep 1, 2016
A 2016-157820 Magnet unit for magnetron sputtering equipment and sputtering method using this magnet unit Sep 1, 2016
2014-38152 Resistance change element and its manufacturing method Aug 8, 2016
A 2016-141830 Film formation method and light emitting diode manufacturing method Aug 8, 2016

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2016-216764 2016-218050 2016-219186 2016-219450 2016-219503 2016-211040 2016-211061 2016-211063 2016-177870 2016-161450 2016-162370 2016-156731 2016-157820 2014-38152 2016-141830

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