Patent Ranking in Japan - Applicant details - Japanese version

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ULVAC, Inc.

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　■　2017 Application Ranking      327th 　publications: 135 （上昇2016: 499th  67）

　■　2017 Acquisition Ranking      348th 　registrations: 80 （下降2016: 236th  145）

（update：Aug 10, 2022）

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ULVAC, Inc.の商標一覧
Publication numberTitle of the InventionPublic. dateRemarks
A 2017-226887 Deposition method Dec 28, 2017
A 2017-227672 Substrate with transparent conductive film, liquid crystal panel, and method for manufacturing substrate with transparent conductive film Dec 28, 2017
A 2017-228661 Method for manufacturing HBC type crystalline solar cell, and HBC type crystalline solar cell Dec 28, 2017
A 2017-224644 Transport device Dec 21, 2017
A 2017-218638 Film forming method and film forming apparatus Dec 14, 2017
A 2017-218639 Metal film forming method and film forming apparatus Dec 14, 2017
A 2017-220626 Method for forming silicon oxide layer Dec 14, 2017
A 2017-213548 Coating device Dec 7, 2017
A 2017-214606 Substrate with transparent conductive film and method for manufacturing the same Dec 7, 2017
A 2017-214630 Film deposition equipment Dec 7, 2017
A 2017-216397 Annealing apparatus and annealing method Dec 7, 2017
2016-116972 Stirrer Nov 30, 2017
A 2017-210642 Ion plating device Nov 30, 2017
2016-147710 Thin film forming equipment Nov 24, 2017
A 2017-208388 Electronic component manufacturing method and processing system Nov 24, 2017

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2017-226887 2017-227672 2017-228661 2017-224644 2017-218638 2017-218639 2017-220626 2017-213548 2017-214606 2017-214630 2017-216397 2016-116972 2017-210642 2016-147710 2017-208388

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