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Tokyo Electron Limited

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  2011 Application Ranking      62th  publications: 621 下降2010: 57th  692)

  2011 Acquisition Ranking      41th  registrations: 739 下降2010: 39th  580)

(update:Sep 24, 2020)

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公報番号発明の名称公報発行日備考
特開 2011-257436 Quartz member Dec 22, 2011
特開 2011-258622 Plasma processing equipment and its dielectric window structure Dec 22, 2011
特開 2011-258218 Pulsation reduction device and inspection device Dec 22, 2011
特開 2011-258924 A storage medium on which a board positioning device, a board processing device, a board positioning method, and a program are recorded. Dec 22, 2011
再表 2010-1938 Plasma processing equipment, plasma processing method and temperature control mechanism for dielectric windows Dec 22, 2011
特開 2011-258925 A storage medium on which a substrate processing apparatus, a substrate processing method, and a program are recorded. Dec 22, 2011
特開 2011-254063 Thin film forming method and film forming equipment Dec 15, 2011
特開 2011-254016 Substrate liquid processing equipment Dec 15, 2011
特開 2011-254107 Substrate processing equipment, substrate processing method and storage medium Dec 15, 2011
特開 2011-253844 Data acquisition method for board processing equipment and sensor board Dec 15, 2011
特開 2011-254019 Substrate liquid processing equipment Dec 15, 2011
特開 2011-253899 Hydrophobicization treatment method and hydrophobization treatment equipment Dec 15, 2011
特開 2011-253897 Substrate processing system and substrate processing method Dec 15, 2011
特開 2011-253842 Lid holding jig Dec 15, 2011
特開 2011-254057 Heat treatment equipment and heat treatment method Dec 15, 2011

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2011-257436 2011-258622 2011-258218 2011-258924 2010-1938 2011-258925 2011-254063 2011-254016 2011-254107 2011-253844 2011-254019 2011-253899 2011-253897 2011-253842 2011-254057

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