Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2012 Application Ranking      53th  publications: 714 上昇2011: 62th  621)

  2012 Acquisition Ranking      37th  registrations: 902 上昇2011: 41th  739)

(update:Oct 22, 2020)

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公報番号発明の名称公報発行日備考
特許 5108557 Load lock device and substrate cooling method Dec 26, 2012
特許 5105399 Data collection method, substrate processing device, substrate processing system Dec 26, 2012
特許 5108909 Backside foreign matter detection method, backside foreign matter detection apparatus and coating apparatus Dec 26, 2012
特許 5107032 Method for controlling chamber cleaning process Dec 26, 2012 共同出願
特許 5108834 Template processing apparatus, imprint system, release agent processing method, program and computer storage medium Dec 26, 2012
特許 5106278 Substrate cleaning apparatus, substrate cleaning method, and storage medium Dec 26, 2012
特許 5111030 Temperature controlled substrate holder with erosion resistant insulating layer for use in substrate processing system Dec 26, 2012
特許 5107842 Substrate processing method Dec 26, 2012
特許 5108238 Inspection method, inspection device, and control program Dec 26, 2012
特許 5107285 Film forming apparatus, film forming method, program, and computer-readable storage medium Dec 26, 2012
特許 5106331 Method for cooling substrate mounting table, computer-readable storage medium, and substrate processing system Dec 26, 2012
特許 5107597 Plasma processing device Dec 26, 2012
特許 5109376 Heating device, heating method and storage medium Dec 26, 2012
特許 5109299 Deposition method Dec 26, 2012
特許 5105833 Electroless plating apparatus, electroless plating method, and computer-readable storage medium Dec 26, 2012

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5108557 5105399 5108909 5107032 5108834 5106278 5111030 5107842 5108238 5107285 5106331 5107597 5109376 5109299 5105833

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七星特許事務所

東京都外神田4-14-2 東京タイムズタワー2703号室 特許・実用新案 鑑定 

特許業務法人 湘洋内外特許事務所

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北大阪特許事務所

〒564-0051 大阪府吹田市豊津町1番18号 エクラート江坂ビル4F 特許・実用新案 意匠 商標 外国特許 鑑定 コンサルティング