Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2015 Application Ranking      56th  publications: 677 上昇2014: 58th  686)

  2015 Acquisition Ranking      51th  registrations: 433 下降2014: 48th  694)

(update:Jan 27, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 5834783 Magnetron sputtering equipment Dec 24, 2015
B 5834944 Magnetron sputtering apparatus and film forming method Dec 24, 2015
B 5835188 Method for removing coating film from peripheral portion of substrate, substrate processing apparatus and storage medium Dec 24, 2015
B 5835195 Method for manufacturing high-pressure container for dry processing and method for manufacturing substrate processing apparatus Dec 24, 2015
B 5835985 Plasma processing apparatus and plasma processing method Dec 24, 2015
B 5836144 Microwave radiation mechanism and surface wave plasma processing device Dec 24, 2015
B 5836419 Plasma etching method Dec 24, 2015
B 5836848 Auxiliary exposure device Dec 24, 2015
B 5836906 Substrate processing apparatus and substrate processing method Dec 24, 2015
B 5836974 Display device manufacturing apparatus and display device manufacturing method Dec 24, 2015
B 5837008 Substrate processing method Dec 24, 2015
B 5837150 Substrate processing method and recording medium recording program for executing the substrate processing method Dec 24, 2015
B 5837525 Substrate processing method, program, and computer storage medium Dec 24, 2015
B 5837649 Substrate processing apparatus, abnormality processing unit determination method, program, and computer storage medium Dec 24, 2015
B 5832397 Substrate processing apparatus and substrate processing method Dec 16, 2015

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5834783 5834944 5835188 5835195 5835985 5836144 5836419 5836848 5836906 5836974 5837008 5837150 5837525 5837649 5832397

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Patent Ranking in Japan

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