Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2015 Application Ranking      56th  publications: 677 上昇2014: 58th  686)

  2015 Acquisition Ranking      51th  registrations: 433 下降2014: 48th  694)

(update:Jun 10, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2013-161768 Film forming method, film forming apparatus, and film forming system Dec 24, 2015
2013-161769 Plasma processing method and plasma processing apparatus Dec 24, 2015
2013-164940 Method for injecting dopant into substrate to be processed, and plasma doping apparatus Dec 24, 2015
2015-537372 Generation of process gas to clean substrates Dec 24, 2015
A 2015-233064 Etching method and bevel etching apparatus Dec 24, 2015
A 2015-229776 Film forming apparatus, film forming method and storage medium Dec 21, 2015
A 2015-230899 Liquid delivery system cleaning method, liquid delivery system, and computer-readable recording medium Dec 21, 2015
A 2015-230905 Peeling device, peeling system, peeling method, program, and computer storage medium Dec 21, 2015
A 2015-230939 Cooling processing device and method of operating cooling processing device Dec 21, 2015
A 2015-230948 Film forming apparatus, film forming method, storage medium Dec 21, 2015
A 2015-230957 Substrate processing apparatus, nozzle cleaning method and nozzle cleaning apparatus Dec 21, 2015
A 2015-230988 Plasma processing apparatus and cleaning method Dec 21, 2015
A 2015-231030 Substrate liquid processing equipment Dec 21, 2015
A 2015-231043 Modification processing method and semiconductor device manufacturing method Dec 21, 2015
A 2015-231050 Basic concept of upper dielectric quartz plate and slot antenna Dec 21, 2015

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2013-161768 2013-161769 2013-164940 2015-537372 2015-233064 2015-229776 2015-230899 2015-230905 2015-230939 2015-230948 2015-230957 2015-230988 2015-231030 2015-231043 2015-231050

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