Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2016 Application Ranking      61th  publications: 616 下降2015: 56th  677)

  2016 Acquisition Ranking      49th  registrations: 561 上昇2015: 51th  433)

(update:Sep 30, 2020)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6051788 Plasma processing apparatus and plasma generator Dec 27, 2016
B 6051858 Substrate processing equipment Dec 27, 2016
B 6051919 Liquid processing device Dec 27, 2016
B 6053656 Liquid processing device Dec 27, 2016
B 6053881 Plasma processing device Dec 27, 2016
B 6054049 Plating method, plating system and storage medium Dec 27, 2016
B 6054213 Support member and semiconductor manufacturing apparatus Dec 27, 2016
B 6054279 Metal wiring layer forming method, metal wiring layer forming apparatus and storage medium Dec 27, 2016
B 6054343 Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and storage medium Dec 27, 2016
B 6054695 Film deposition equipment Dec 27, 2016
B 6054856 Method of forming insulating region Dec 27, 2016
B 6055387 Joining method, program, computer storage medium, and joining system Dec 27, 2016
B 6055537 Plasma processing method Dec 27, 2016
B 6055783 Substrate mounting table and plasma processing device Dec 27, 2016
B 6046974 Pattern formation method Dec 21, 2016

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6051788 6051858 6051919 6053656 6053881 6054049 6054213 6054279 6054343 6054695 6054856 6055387 6055537 6055783 6046974

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Patent Ranking in Japan

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共栄国際特許商標事務所

〒543-0014 大阪市天王寺区玉造元町2番32-1301 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング