Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2016 Application Ranking      61th  publications: 616 下降2015: 56th  677)

  2016 Acquisition Ranking      49th  registrations: 561 上昇2015: 51th  433)

(update:Aug 2, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6042160 Film forming method and film forming apparatus Dec 14, 2016
B 6042415 Semiconductor device manufacturing method Dec 14, 2016
B 6042498 High-precision etching method for substrates Dec 14, 2016
B 6042760 Probe device Dec 14, 2016
B 6042761 Probe device Dec 14, 2016
B 6043046 Etching gas supply method and etching equipment Dec 14, 2016
B 6043600 Substrate processing equipment and substrate processing method Dec 14, 2016
B 6044371 Liquid treatment method, liquid treatment equipment and storage medium Dec 14, 2016
B 6044373 Board transfer device Dec 14, 2016
B 6044428 Substrate processing method, substrate processing equipment and storage medium Dec 14, 2016
B 6045482 Surface treatment equipment, surface treatment methods, programs and computer storage media Dec 14, 2016
B 6045485 Board processing equipment Dec 14, 2016
B 6045504 Side wall image transfer pitch doubling and in-line limit dimension slimming Dec 14, 2016
B 6045646 Plasma etching method Dec 14, 2016
B 6045746 Track processing to remove organic films in induced self-assembling chemoepitaxi applications Dec 14, 2016

31-45 (total:572)

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6042160 6042415 6042498 6042760 6042761 6043046 6043600 6044371 6044373 6044428 6045482 6045485 6045504 6045646 6045746

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Patent Ranking in Japan

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