Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2016 Application Ranking      61th  publications: 616 下降2015: 56th  677)

  2016 Acquisition Ranking      49th  registrations: 561 上昇2015: 51th  433)

(update:Jul 29, 2021)

2011  2012  2013  2014  2015  2017  2018  2019  2020  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6033048 Liquid treatment equipment Nov 30, 2016
B 6033453 Plasma endpoint detection using multivariate analysis Nov 30, 2016
B 6033595 Distance measurement method in substrate processing equipment and substrate processing equipment Nov 30, 2016
B 6033785 Etching method and equipment Nov 30, 2016
B 6034156 Plasma processing apparatus and plasma processing method Nov 30, 2016
B 6034655 Plasma processing equipment Nov 30, 2016
B 6035117 Plasma etching method and plasma etching equipment Nov 30, 2016
B 6035279 Film thickness measuring device, film thickness measuring method, program and computer storage medium Nov 30, 2016
B 6036742 Dust collection jig, substrate processing device and particle collection method. Nov 30, 2016
B 6029452 Board processing equipment Nov 24, 2016
B 6029522 How to form a pattern Nov 24, 2016
B 6029623 Plasma processing equipment and methods, as well as computer-readable storage media Nov 24, 2016
B 6030099 Residual layer removing method and residual layer removing device Nov 24, 2016
B 6030439 Manganese-containing film forming methods, treatment systems, and electronic device manufacturing methods Nov 24, 2016
B 6030455 Method of forming a silicon oxide film Nov 24, 2016

61-75 (total:572)

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6033048 6033453 6033595 6033785 6034156 6034655 6035117 6035279 6036742 6029452 6029522 6029623 6030099 6030439 6030455

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Patent Ranking in Japan

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オーブ国際特許事務所(東京都)-ソフトウェア・電気電子分野専門

東京都千代田区飯田橋3-3-11新生ビル5階 特許・実用新案 商標 外国特許 鑑定