Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2017 Application Ranking      83th  publications: 585 下降2016: 61th  616)

  2017 Acquisition Ranking      66th  registrations: 431 下降2016: 49th  561)

(update:Jun 18, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6253748 Film forming method and film forming apparatus Dec 27, 2017
B 6254054 Coating device, joining system, coating method, joining method, program, and information storage medium Dec 27, 2017
B 6254093 Substrate processing apparatus and control apparatus for substrate processing apparatus Dec 27, 2017
B 6254459 Polymer film chemical resistance improving method, polymer film forming method, film forming apparatus, and electronic product manufacturing method Dec 27, 2017
B 6254516 Substrate processing apparatus and substrate processing method Dec 27, 2017
B 6254929 Measurement processing apparatus, substrate processing system, measurement jig, measurement processing method, and storage medium thereof Dec 27, 2017
B 6255187 Method of etching silicon oxide film Dec 27, 2017
B 6248562 Plasma processing apparatus and plasma processing method Dec 20, 2017
B 6248707 Semiconductor manufacturing apparatus, film forming method and storage medium Dec 20, 2017
B 6249659 Plasma processing device Dec 20, 2017
B 6249970 Method of manufacturing semiconductor device Dec 20, 2017
B 6244518 Plasma processing method and plasma processing apparatus Dec 13, 2017
B 6245399 Substrate processing equipment Dec 13, 2017
B 6246558 Silicon oxycarbonitride film, silicon oxycarbide film, silicon oxynitride film forming method and film forming apparatus Dec 13, 2017
B 6246673 Measuring apparatus, substrate processing system and measuring method Dec 13, 2017

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6253748 6254054 6254093 6254459 6254516 6254929 6255187 6248562 6248707 6249659 6249970 6244518 6245399 6246558 6246673

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Patent Ranking in Japan

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