Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2018 Application Ranking      67th  publications: 588 上昇2017: 83th  585)

  2018 Acquisition Ranking      50th  registrations: 503 上昇2017: 66th  431)

(update:Jul 29, 2021)

2011  2012  2013  2014  2015  2016  2017  2019  2020  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6443242 Nozzle, treatment liquid supply device, liquid treatment device, and treatment liquid supply method Dec 26, 2018
B 6443243 Substrate processing method Dec 26, 2018
B 6444256 Coating apparatus and coating method Dec 26, 2018
B 6444277 Substrate processing apparatus and substrate processing method Dec 26, 2018
B 6444438 Substrate processing brush and substrate processing apparatus Dec 26, 2018
B 6444782 Tuner and microwave plasma source Dec 26, 2018
B 6444843 Substrate processing method, substrate processing apparatus and storage medium Dec 26, 2018
B 6444909 Substrate processing method, substrate processing apparatus, and computer-readable recording medium Dec 26, 2018
B 6446334 Plasma processing apparatus, control method of plasma processing apparatus, and storage medium Dec 26, 2018
B 6438831 Method of etching organic film Dec 19, 2018
B 6439005 Method for depositing a planarization layer using polymerization chemical vapor deposition Dec 19, 2018
B 6439203 Method for determining backside texturing of a semiconductor substrate Dec 19, 2018
B 6439766 Coating and developing method and coating and developing device Dec 19, 2018
B 6440850 Graphene manufacturing method, graphene manufacturing apparatus, and electronic device manufacturing method Dec 19, 2018
B 6440864 Liquid processing device Dec 19, 2018

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6443242 6443243 6444256 6444277 6444438 6444782 6444843 6444909 6446334 6438831 6439005 6439203 6439766 6440850 6440864

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Patent Ranking in Japan

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いわさき特許・商標事務所 埼玉県戸田市

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富士国際特許事務所

【名古屋オフィス】 〒462-0002愛知県名古屋市中区丸の内2-10-30インテリジェント林ビル2階 【可児オフィス】 〒509-0203岐阜県可児市下恵土 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング