Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2018 Application Ranking      67th  publications: 588 上昇2017: 83th  585)

  2018 Acquisition Ranking      50th  registrations: 503 上昇2017: 66th  431)

(update:Sep 26, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
2017-158955 Substrate processing apparatus, substrate processing method, and computer-readable recording medium Dec 27, 2018
2017-159401 Method of aligning a chip component to a substrate using a liquid Dec 27, 2018
A 2018-202361 Plasma spray head, plasma spray apparatus and plasma spray method Dec 27, 2018
A 2018-204810 Vacuum dryer Dec 27, 2018
A 2018-206796 Substrate processing method Dec 27, 2018
A 2018-206803 Method of operating electrostatic chuck of plasma processing apparatus Dec 27, 2018
A 2018-206804 Electrostatic chuck and plasma processing device Dec 27, 2018
A 2018-206805 Plasma processing method Dec 27, 2018
A 2018-206806 Stage and plasma processing equipment Dec 27, 2018
A 2018-206876 Substrate liquid processing apparatus, processing liquid supply method and storage medium Dec 27, 2018
A 2018-206913 Member and plasma processing device Dec 27, 2018
A 2018-206935 Plasma processing apparatus, electrostatic adsorption method, and electrostatic adsorption program Dec 27, 2018
A 2018-206936 Substrate processing system and substrate processing method Dec 27, 2018
A 2018-206937 Etching method and etching apparatus Dec 27, 2018
A 2018-206948 Inspection device, inspection system, and alignment method Dec 27, 2018

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2017-158955 2017-159401 2018-202361 2018-204810 2018-206796 2018-206803 2018-206804 2018-206805 2018-206806 2018-206876 2018-206913 2018-206935 2018-206936 2018-206937 2018-206948

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