Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2018 Application Ranking      67th  publications: 588 上昇2017: 83th  585)

  2018 Acquisition Ranking      50th  registrations: 503 上昇2017: 66th  431)

(update:Jul 26, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2017-158955 Substrate processing apparatus, substrate processing method, and computer-readable recording medium Dec 27, 2018
2017-159401 Method of aligning a chip component to a substrate using a liquid Dec 27, 2018
A 2018-202361 Plasma spray head, plasma spray apparatus and plasma spray method Dec 27, 2018
A 2018-204810 Vacuum dryer Dec 27, 2018
A 2018-206796 Substrate processing method Dec 27, 2018
A 2018-206803 Method of operating electrostatic chuck of plasma processing apparatus Dec 27, 2018
A 2018-206804 Electrostatic chuck and plasma processing device Dec 27, 2018
A 2018-206805 Plasma processing method Dec 27, 2018
A 2018-206806 Stage and plasma processing equipment Dec 27, 2018
A 2018-206876 Substrate liquid processing apparatus, processing liquid supply method and storage medium Dec 27, 2018
A 2018-206913 Member and plasma processing device Dec 27, 2018
A 2018-206935 Plasma processing apparatus, electrostatic adsorption method, and electrostatic adsorption program Dec 27, 2018
A 2018-206936 Substrate processing system and substrate processing method Dec 27, 2018
A 2018-206937 Etching method and etching apparatus Dec 27, 2018
A 2018-206948 Inspection device, inspection system, and alignment method Dec 27, 2018

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2017-158955 2017-159401 2018-202361 2018-204810 2018-206796 2018-206803 2018-206804 2018-206805 2018-206806 2018-206876 2018-206913 2018-206935 2018-206936 2018-206937 2018-206948

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Patent Ranking in Japan

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〒195-0074 東京都町田市山崎町1089-10 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング 

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〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

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〒130-0022 東京都墨田区江東橋4-24-5 協新ビル402 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング