Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2019 Application Ranking      58th  publications: 660 上昇2018: 67th  588)

  2019 Acquisition Ranking      58th  registrations: 415 下降2018: 50th  503)

(update:Sep 22, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6623511 Plasma processing device Dec 25, 2019
B 6623943 Semiconductor device manufacturing method, heat treatment apparatus, and storage medium. Dec 25, 2019
B 6624833 Microwave plasma source and plasma processing apparatus Dec 25, 2019
B 6624998 Method and apparatus for forming boron-doped silicon germanium film Dec 25, 2019
B 6625005 Temperature measurement method Dec 25, 2019
B 6625122 Plasma processing apparatus and plasma processing method Dec 25, 2019
B 6625200 Method of manufacturing semiconductor device Dec 25, 2019
B 6625423 Wafer inspection apparatus and maintenance method thereof Dec 25, 2019
B 6625597 Transport chamber Dec 25, 2019
B 6625714 Substrate processing equipment Dec 25, 2019
B 6626734 Substrate processing apparatus, substrate processing method, and computer-readable recording medium Dec 25, 2019
B 6626753 Workpiece processing equipment Dec 25, 2019
B 6626800 Method for inspecting shower plate of plasma processing apparatus Dec 25, 2019
B 6621882 Etching equipment Dec 18, 2019
B 6617649 Method for setting placement position of substrate to be processed and film forming system Dec 11, 2019

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6623511 6623943 6624833 6624998 6625005 6625122 6625200 6625423 6625597 6625714 6626734 6626753 6626800 6621882 6617649

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Patent Ranking in Japan

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