Tokyo Electron Limited
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■ 2019 Application Ranking 58th publications: 660
（
2018: 67th 588）
■ 2019 Acquisition Ranking 58th registrations: 415
（
2018: 50th 503）
（update：Sep 30, 2020）
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2018
2020
| Publication number | Title of the Invention | Public. date | Remarks |
2018-135488
|
Foreign object detection device, foreign object detection method, and storage medium |
Dec 26, 2019 |
|
| 2018-163913
|
Contact pad manufacturing method, semiconductor device manufacturing method using the same, and semiconductor device |
Dec 26, 2019 |
|
| A 2019-218593
|
Metal film forming method and film forming apparatus |
Dec 26, 2019 |
|
| A 2019-218616
|
Control device, film forming device, control method, film forming method, and control program |
Dec 26, 2019 |
|
| A 2019-218621
|
Substrate mounting table and film forming apparatus |
Dec 26, 2019 |
|
| A 2019-219561
|
Microlens manufacturing method and plasma processing apparatus |
Dec 26, 2019 |
|
| A 2019-220282
|
Plasma processing apparatus and plasma processing method |
Dec 26, 2019 |
|
| A 2019-220289
|
Organic EL panel and method for manufacturing organic EL panel |
Dec 26, 2019 |
|
| A 2019-220435
|
Plasma processing apparatus and method for generating plasma |
Dec 26, 2019 |
|
| A 2019-220497
|
Mounting table and plasma processing device |
Dec 26, 2019 |
|
| A 2019-220508
|
Etching method and plasma processing apparatus |
Dec 26, 2019 |
|
| A 2019-220509
|
Vacuum processing apparatus, vacuum processing system, and vacuum processing method |
Dec 26, 2019 |
|
| A 2019-220510
|
Coating film forming method and coating film forming apparatus |
Dec 26, 2019 |
|
| A 2019-220515
|
Substrate processing equipment |
Dec 26, 2019 |
|
| A 2019-220517
|
Substrate processing apparatus and substrate processing method |
Dec 26, 2019 |
|
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2018-135488 2018-163913 2019-218593 2019-218616 2019-218621 2019-219561 2019-220282 2019-220289 2019-220435 2019-220497 2019-220508 2019-220509 2019-220510 2019-220515 2019-220517
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