Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2019 Application Ranking      58th  publications: 660 上昇2018: 67th  588)

  2019 Acquisition Ranking      58th  registrations: 415 下降2018: 50th  503)

(update:Sep 30, 2020)

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Publication numberTitle of the InventionPublic. dateRemarks
2018-135488 Foreign object detection device, foreign object detection method, and storage medium Dec 26, 2019
2018-163913 Contact pad manufacturing method, semiconductor device manufacturing method using the same, and semiconductor device Dec 26, 2019
A 2019-218593 Metal film forming method and film forming apparatus Dec 26, 2019
A 2019-218616 Control device, film forming device, control method, film forming method, and control program Dec 26, 2019
A 2019-218621 Substrate mounting table and film forming apparatus Dec 26, 2019
A 2019-219561 Microlens manufacturing method and plasma processing apparatus Dec 26, 2019
A 2019-220282 Plasma processing apparatus and plasma processing method Dec 26, 2019
A 2019-220289 Organic EL panel and method for manufacturing organic EL panel Dec 26, 2019
A 2019-220435 Plasma processing apparatus and method for generating plasma Dec 26, 2019
A 2019-220497 Mounting table and plasma processing device Dec 26, 2019
A 2019-220508 Etching method and plasma processing apparatus Dec 26, 2019
A 2019-220509 Vacuum processing apparatus, vacuum processing system, and vacuum processing method Dec 26, 2019
A 2019-220510 Coating film forming method and coating film forming apparatus Dec 26, 2019
A 2019-220515 Substrate processing equipment Dec 26, 2019
A 2019-220517 Substrate processing apparatus and substrate processing method Dec 26, 2019

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2018-135488 2018-163913 2019-218593 2019-218616 2019-218621 2019-219561 2019-220282 2019-220289 2019-220435 2019-220497 2019-220508 2019-220509 2019-220510 2019-220515 2019-220517

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