Patent Ranking in Japan - Applicant details - Japanese version

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Tokyo Electron Limited

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  2020 Application Ranking      43th  publications: 773 上昇2019: 58th  660)

  2020 Acquisition Ranking      54th  registrations: 436 上昇2019: 58th  415)

(update:Jun 10, 2021)

2011  2012  2013  2014  2015  2016  2017  2018  2019  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6803701 Substrate processing equipment, substrate processing method and recording medium Dec 23, 2020
B 6803755 Substrate processing equipment, substrate processing method and storage medium Dec 23, 2020
B 6803815 Substrate processing equipment and operation method of substrate processing equipment Dec 23, 2020
B 6804249 Coating device, coating method, and organic EL display Dec 23, 2020
B 6804250 Vacuum drying device and vacuum drying method Dec 23, 2020
B 6804270 Substrate processing equipment and substrate processing method Dec 23, 2020
B 6804277 Processing method and processing equipment Dec 23, 2020
B 6804278 Supercritical fluid manufacturing equipment and substrate processing equipment Dec 23, 2020
B 6804280 Plasma processing equipment and plasma processing method Dec 23, 2020
B 6804309 Heat treatment equipment and temperature control method Dec 23, 2020
B 6804325 Liquid treatment equipment Dec 23, 2020
B 6804353 Wafer inspection device and diagnostic method for wafer inspection device Dec 23, 2020
B 6804392 Plasma processing equipment and gas shower head Dec 23, 2020
B 6805017 Coating device and coating method Dec 23, 2020
B 6805018 Coating device and coating method Dec 23, 2020

1-15 (total:443)

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6803701 6803755 6803815 6804249 6804250 6804270 6804277 6804278 6804280 6804309 6804325 6804353 6804392 6805017 6805018

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Patent Ranking in Japan

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