Patent Ranking in Japan - Applicant details - Japanese version

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Topcon Co., Ltd.

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  2019 Application Ranking      166th  publications: 284 下降2018: 165th  263)

  2019 Acquisition Ranking      158th  registrations: 175 上昇2018: 320th  89)

(update:Nov 25, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
A 2019-216816 Ophthalmic equipment Dec 26, 2019
A 2019-216817 Ophthalmic equipment Dec 26, 2019
A 2019-216818 Ophthalmic equipment Dec 26, 2019
A 2019-219206 Measuring system Dec 26, 2019
A 2019-219238 Reflector position calculating device, reflector position calculating method, and reflector position calculating program Dec 26, 2019
A 2019-219319 Vertical measurement system and reference point tracing method Dec 26, 2019
A 2019-213729 Slit lamp microscope and ophthalmic system Dec 19, 2019
A 2019-213733 Slit lamp microscope and ophthalmic system Dec 19, 2019
A 2019-213734 Slit lamp microscope and ophthalmic system Dec 19, 2019
A 2019-213739 Ophthalmic apparatus, control method thereof, program, and recording medium Dec 19, 2019
A 2019-213740 Ophthalmic apparatus, control method thereof, program, and recording medium Dec 19, 2019
A 2019-213751 Ophthalmologic apparatus and control method thereof Dec 19, 2019
A 2019-213752 Ophthalmic apparatus and method for controlling ophthalmic apparatus Dec 19, 2019
A 2019-211220 Surveying equipment and systems Dec 12, 2019
A 2019-211222 Surveying equipment Dec 12, 2019

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2019-216816 2019-216817 2019-216818 2019-219206 2019-219238 2019-219319 2019-213729 2019-213733 2019-213734 2019-213739 2019-213740 2019-213751 2019-213752 2019-211220 2019-211222

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Patent Ranking in Japan

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