Patent Ranking in Japan - Applicant details - Japanese version

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Shin-Etsu Chemical Co., Ltd.

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  2015 Application Ranking      94th  publications: 457 上昇2014: 113th  412)

  2015 Acquisition Ranking      59th  registrations: 406 上昇2014: 66th  549)

(update:Jul 1, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
B 5834755 Method of forming cured release film Dec 24, 2015
B 5835069 Antifouling imparting hard coat composition Dec 24, 2015
B 5835100 Antistatic silicone rubber composition and method for suppressing yellowing of antistatic silicone rubber cured product Dec 24, 2015
B 5835116 Organosilicon compound having amino group and protected hydroxyl group and method for producing the same Dec 24, 2015
B 5835148 Pattern forming method and resist composition Dec 24, 2015
B 5835194 Resist underlayer film material and pattern forming method Dec 24, 2015
B 5835204 Resist material and pattern forming method using the same Dec 24, 2015
B 5835472 Water-absorbent silicone rubber particles and method for producing the same Dec 24, 2015
B 5836446 Optical fiber Dec 24, 2015
B 5836980 Drug-containing particles, solid preparation and method for producing drug-containing particles Dec 24, 2015
B 5837474 Method for manufacturing solar cell module Dec 24, 2015
B 5832983 Silicone composition Dec 16, 2015
B 5833492 Silicon compound, polysiloxane compound, composition for forming resist underlayer film containing the same, and pattern forming method Dec 16, 2015
B 5828795 Method of evaluating crystal orientation of polycrystalline silicon, method of selecting polycrystalline silicon rod, and method of manufacturing single crystal silicon Dec 9, 2015
B 5829314 Photomask blank manufacturing method Dec 9, 2015

1-15 (total:423)

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5834755 5835069 5835100 5835116 5835148 5835194 5835204 5835472 5836446 5836980 5837474 5832983 5833492 5828795 5829314

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Patent Ranking in Japan

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新名古屋特許商標事務所

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松嶋知的財産事務所

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特許業務法人 IPX

東京都港区北青山2丁目7番20号 第二猪瀬ビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング