Patent Ranking in Japan - Applicant details - Japanese version

ホーム > Japan Patent Ranking > Shin-Etsu Chemical Co., Ltd. > 2016 > Patents

Shin-Etsu Chemical Co., Ltd.

※ You can add "Shin-Etsu Chemical Co., Ltd." to your own list by loggin in. About Login

  2016 Application Ranking      98th  publications: 436 下降2015: 94th  457)

  2016 Acquisition Ranking      69th  registrations: 422 下降2015: 59th  406)

(update:Aug 4, 2021)

2011  2012  2013  2014  2015  2017  2018  2019  2020  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6052094 Method for producing polytetrafluoroethylene powder composition and method for producing resin composition containing the same Dec 27, 2016
B 6052140 Organoxysilane compound having bissilylamino group and method for producing the same Dec 27, 2016
B 6052207 Positive resist material and pattern forming method using the same Dec 27, 2016
B 6052800 Optical isolator Dec 27, 2016
B 6053029 Gel composition and water absorption inhibitor Dec 27, 2016
B 6053960 Polysiloxane macromonomer for ophthalmic lens and ophthalmic lens using the same Dec 27, 2016
B 6046594 Method for producing negative electrode material for lithium-ion secondary battery and method for producing lithium-ion secondary battery Dec 21, 2016
B 6046646 Onium salt, chemically amplified positive resist composition, and pattern forming method Dec 21, 2016
B 6047578 Antistatic release agent and antistatic release film Dec 21, 2016
B 6048332 Method for producing seal for polymer electrolyte fuel cell separator and silicone rubber composition used in the method Dec 21, 2016
B 6048345 Resist material and pattern forming method using the same Dec 21, 2016
B 6048367 White thermosetting epoxy/silicone hybrid resin composition for LED reflector, and pre-molded package comprising molded and cured product of the resin composition Dec 21, 2016
B 6048380 Organic silicon compound having oxetane ring and method for producing the same Dec 21, 2016
B 6048424 Method of performing atmospheric pressure hydrogenation reaction Dec 21, 2016
B 6049571 Method for manufacturing composite substrate having nitride semiconductor thin film Dec 21, 2016

1-15 (total:441)

1 2 3 4 5 6 7next>

: select publication number

Copy all numbers

6052094 6052140 6052207 6052800 6053029 6053960 6046594 6046646 6047578 6048332 6048345 6048367 6048380 6048424 6049571

※ You can add applicants to the list by logging in. Useful for checking trends in "Shin-Etsu Chemical Co., Ltd." intellectual property.

About Login

  • このサイトをYahoo!ブックマークに登録
  • はてなブックマークに追加

Patent Ranking in Japan

2021 Application Ranking2021 Acquisition Ranking
2020 Application Ranking2020 Acquisition Ranking
2019 Application Ranking2019 Acquisition Ranking
2018 Application Ranking2018 Acquisition Ranking
2017 Application Ranking2017 Acquisition Ranking
2015 Application Ranking2015 Acquisition Ranking
2014 Application Ranking2014 Acquisition Ranking
2013 Application Ranking2013 Acquisition Ranking
2012 Application Ranking2012 Acquisition Ranking
2011 Application Ranking2011 Acquisition Ranking
Applicant Search (Japanese only)

特許事務所紹介 IP Force 特許事務所紹介

名古屋国際特許業務法人

〒460-0003 愛知県名古屋市中区錦1-20-19 名神ビル2F 〒107-0052 東京都港区赤坂2-2-21 永田町法曹ビル9F(東京支店) 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

藤田特許商標事務所

〒104-0061 東京都中央区銀座1-8-2 銀座プルミエビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

三都国際特許商標事務所

〒530-0044 大阪府大阪市北区東天満1丁目11番15号 若杉グランドビル別館802 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング