Patent Ranking in Japan - Applicant details - Japanese version

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Shin-Etsu Chemical Co., Ltd.

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  2016 Application Ranking      98th  publications: 436 下降2015: 94th  457)

  2016 Acquisition Ranking      69th  registrations: 422 下降2015: 59th  406)

(update:Aug 10, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6020419 Waterproof construction method for outdoor tanks Nov 2, 2016
B 6020477 Positive resist material and pattern formation method using it Nov 2, 2016
B 6020727 Silicone rubber composition Nov 2, 2016
B 6020740 Method for producing UV-curable organopolysiloxane composition and plate material Nov 2, 2016
B 6015114 Material for forming near-infrared light absorbing film and laminated film having near-infrared light absorbing film Oct 26, 2016
B 6015234 Conductive adhesive Oct 26, 2016
B 6015616 Method for producing cellulose ether powder or granular material Oct 26, 2016
B 6015780 Method for manufacturing a translucent metal oxide sintered body Oct 26, 2016
B 6016107 Addition-curable silicone composition Oct 26, 2016
B 6012546 Gel composition and water absorption inhibitor Oct 25, 2016
B 6013218 Acid generator, chemically amplified resist material, and pattern formation method Oct 25, 2016
B 6008137 Surface organic resin-coated hydrophobic spherical silica fine particles, manufacturing method thereof, and toner external agent for static charge image development using the same Oct 19, 2016
B 6008784 Pellicle frame and its manufacturing method and pellicle Oct 19, 2016
B 6010279 Method for manufacturing negative electrode active material for non-aqueous electrolyte secondary batteries Oct 19, 2016
B 6010429 A method for producing silicon-containing particles for a negative electrode active material for a non-aqueous electrolyte secondary battery, a method for producing a negative electrode material for a non-aqueous electrolyte secondary battery, and a method for producing a non-aqueous electrolyte secondary battery. Oct 19, 2016

76-90 (total:441)

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6020419 6020477 6020727 6020740 6015114 6015234 6015616 6015780 6016107 6012546 6013218 6008137 6008784 6010279 6010429

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Patent Ranking in Japan

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特許事務所紹介 IP Force 特許事務所紹介

特許業務法人 浅村特許事務所 (東京都品川区)

〒140-0002 東京都品川区東品川2丁目2番24号 天王洲セントラルタワー21F・22F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

浅村合同事務所

東京都品川区東品川2丁目2番24号 天王洲セントラルタワー 22階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング