Patent Ranking in Japan - Applicant details - Japanese version

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Shin-Etsu Chemical Co., Ltd.

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  2019 Application Ranking      116th  publications: 395 下降2018: 111th  387)

  2019 Acquisition Ranking      73th  registrations: 341 下降2018: 71th  392)

(update:Jan 20, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2018-159754 Silicon carbide substrate manufacturing method and silicon carbide substrate Dec 26, 2019
A 2019-218299 Cyclic aminoorganoxysilane compound and method for producing the same Dec 26, 2019
A 2019-218312 Method for producing organosilicon compound Dec 26, 2019
A 2019-218336 COMPOUND, METHOD FOR PRODUCING COMPOUND, AND COMPOSITION FOR ORGANIC FILM FORMATION Dec 26, 2019
A 2019-218337 Compound and composition for forming organic film Dec 26, 2019
A 2019-218495 Ultraviolet curable silicone rubber composition and cured product Dec 26, 2019
A 2019-219495 Evaluation method of photomask blank related substrate Dec 26, 2019
A 2019-220511 Method for manufacturing substrate for microdisplay Dec 26, 2019
2018-159595 Catalyst for hydrosilylation reaction, hydrogenation reaction and hydrosilane reduction reaction Dec 19, 2019
2018-159599 Method for producing transition metal-isocyanide complex Dec 19, 2019
2018-180704 Addition-curable silicone composition Dec 19, 2019
A 2019-214207 Screen printing machine, screen printing method and solar cell electrode forming method Dec 19, 2019
A 2019-214640 Addition curable liquid conductive silicone rubber composition and electrophotographic image forming member Dec 19, 2019
A 2019-214704 Method for separating and purifying perfluoropolyether compound Dec 19, 2019
A 2019-216180 Method for manufacturing GaN laminated substrate Dec 19, 2019

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2018-159754 2019-218299 2019-218312 2019-218336 2019-218337 2019-218495 2019-219495 2019-220511 2018-159595 2018-159599 2018-180704 2019-214207 2019-214640 2019-214704 2019-216180

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Patent Ranking in Japan

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