Patent Ranking in Japan - Applicant details - Japanese version

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SCREEN Holdings Co., Ltd.

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  2017 Application Ranking      145th  publications: 368 下降2016: 117th  374)

  2017 Acquisition Ranking      139th  registrations: 238 上昇2016: 147th  240)

(update:Aug 12, 2022)

2011  2012  2013  2014  2015  2016  2018  2019  2020  2021  2022 

Publication numberTitle of the InventionPublic. dateRemarks
B 6252906 Aperture pattern design method, image restoration method, and image restoration device Dec 27, 2017
B 6253440 Vector data processing device, image recording system, vector data processing method and program Dec 27, 2017
B 6254821 Recording medium heating device and system having the same Dec 27, 2017
B 6254877 Catalyst layer forming method and catalyst layer forming apparatus Dec 27, 2017
B 6254896 Image signal generation device, image inspection device, printing system, and image signal generation method Dec 27, 2017
B 6250415 Pattern drawing apparatus and pattern drawing method Dec 20, 2017
B 6250425 Image recording apparatus and image recording method Dec 20, 2017
B 6250973 Substrate processing apparatus and substrate processing method Dec 20, 2017
B 6251000 Scan image correction method Dec 20, 2017
B 6251086 Substrate processing apparatus and substrate processing method Dec 20, 2017
B 6245545 Inspection device and inspection method Dec 13, 2017
B 6246602 Substrate processing equipment Dec 13, 2017
B 6246605 Peeling device and peeling method Dec 13, 2017
B 6246606 Substrate processing equipment Dec 13, 2017
B 6246642 Phase difference measuring device Dec 13, 2017

1-15 (total:250)

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6252906 6253440 6254821 6254877 6254896 6250415 6250425 6250973 6251000 6251086 6245545 6246602 6246605 6246606 6246642

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新名古屋特許商標事務所

〒453-0012 愛知県名古屋市中村区井深町1番1号 新名古屋センタービル・本陣街2階 243-1号室 特許・実用新案 意匠 商標 訴訟 鑑定 コンサルティング 

IPボランチ国際特許事務所

東京都武蔵野市吉祥寺本町1丁目35-14-202 特許・実用新案 意匠 商標 外国特許 鑑定 コンサルティング 

特許業務法人 浅村特許事務所 (東京都品川区)

〒140-0002 東京都品川区東品川2丁目2番24号 天王洲セントラルタワー21F・22F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング