Patent Ranking in Japan - Applicant details - Japanese version

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Nikon Corporation

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  2020 Application Ranking      83th  publications: 382 下降2019: 70th  588)

  2020 Acquisition Ranking      52th  registrations: 354 下降2019: 46th  507)

(update:Oct 22, 2020)

2011  2012  2013  2014  2015  2016  2017  2018  2019 

Publication numberTitle of the InventionPublic. dateRemarks
B 6772437 interchangeable lens Oct 21, 2020
B 6772442 Microscope device and observation method Oct 21, 2020
B 6772462 Object positioning method and object positioning device, and device manufacturing method and device manufacturing device Oct 21, 2020
B 6772472 Arrangement method and arrangement device, and device manufacturing method and device manufacturing method Oct 21, 2020
B 6772698 Encoder device, drive device, stage device, and robot device Oct 21, 2020
B 6773050 Encoder device, drive device, stage device, and robot device Oct 21, 2020
B 6773125 Variable magnification optics, optical equipment and imaging equipment Oct 21, 2020
B 6773168 Pattern exposure equipment Oct 21, 2020
B 6773174 Cylindrical mask unit Oct 21, 2020
B 6773206 Imaging device Oct 21, 2020
B 6774031 Layout method, mark detection method, exposure method, measuring device, exposure device, and device manufacturing method Oct 21, 2020
B 6774038 Exposure equipment and exposure method, flat panel display manufacturing method, and device manufacturing method Oct 21, 2020
B 6774039 Wave surface measurement method and equipment, exposure method and equipment, and device manufacturing method Oct 21, 2020
B 6766872 Wideband Reflective Refraction Microscope Objective Lens with Small Central Shield Oct 14, 2020
B 6766882 Image processing equipment, microscope systems, image processing methods, and computer programs Oct 14, 2020

1-15 (total:342)

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6772437 6772442 6772462 6772472 6772698 6773050 6773125 6773168 6773174 6773206 6774031 6774038 6774039 6766872 6766882

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Patent Ranking in Japan

2019 Application Ranking2019 Acquisition Ranking
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〒973-8403 福島県いわき市内郷綴町榎下16-3 内郷商工会別棟事務所2階 特許・実用新案 意匠 商標 コンサルティング 

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横浜市中区本町1-7 東ビル4階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング