Patent Ranking in Japan - Applicant details - Japanese version

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New Flare Technology Co., Ltd.

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  2017 Application Ranking      450th  publications: 88 下降2016: 354th  106)

  2017 Acquisition Ranking      453th  registrations: 58 上昇2016: 493th  56)

(update:Jul 29, 2021)

2011  2012  2013  2014  2015  2016  2018  2019  2020  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6252403 Aperture member manufacturing method Dec 27, 2017
B 6253924 Charged particle beam drawing device and charged particle beam drawing method Dec 27, 2017
B 6255191 Inspection equipment and inspection method Dec 27, 2017
B 6251559 Sample support device Dec 20, 2017
B 6251647 Mask inspection device and mask inspection method Dec 20, 2017
B 6251648 Charged particle beam drawing device and charged particle beam drawing method Dec 20, 2017
B 6248134 Charged particle beam drawing device Dec 13, 2017
B 6240045 Anomaly detection method and electron beam lithography system Nov 29, 2017
B 6236216 Inspection equipment and inspection method Nov 22, 2017
B 6230881 Multi-charged particle beam blanking device and multi-charged particle beam drawing method Nov 15, 2017
B 6226677 Semiconductor manufacturing equipment and semiconductor manufacturing method Nov 8, 2017
B 6228751 Inspection equipment Nov 8, 2017
B 6220521 Inspection equipment Oct 25, 2017
B 6220553 Focal position adjustment method and inspection method Oct 25, 2017
B 6214441 Deviator cleaning device and deviator cleaning method Oct 18, 2017

1-15 (total:59)

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6252403 6253924 6255191 6251559 6251647 6251648 6248134 6240045 6236216 6230881 6226677 6228751 6220521 6220553 6214441

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Patent Ranking in Japan

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