Patent Ranking in Japan - Applicant details - Japanese version

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NEC Platforms Co., Ltd.

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　■　2019 Application Ranking      129th 　publications: 365 （上昇2018: 168th  257）

　■　2019 Acquisition Ranking      79th 　registrations: 325 （上昇2018: 101th  310）

（update：Feb 25, 2021）

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Publication numberTitle of the InventionPublic. dateRemarks
B 6624637 Discharge control device, discharge control system, discharge control method and program Dec 25, 2019
B 6624640 Wireless LAN communication device Dec 25, 2019
B 6624647 Power supply device, power supply device control method, and information processing device Dec 25, 2019
B 6624649 Support device, fixture and support method Dec 25, 2019
B 6624650 antenna Dec 25, 2019
B 6624657 Wireless communication device, program, and wireless communication system Dec 25, 2019
B 6625836 Communication device, communication method, and communication program Dec 25, 2019
B 6626049 Control device, control method and program Dec 25, 2019
B 6621144 Emergency call acceptance system, device, user terminal device, method, and program Dec 18, 2019
B 6621146 Communication device, communication terminal, communication system, communication control method, and communication control program Dec 18, 2019
B 6621151 Information processing apparatus, system, method and program Dec 18, 2019
B 6621153 Server device, cooling method Dec 18, 2019
B 6621157 Management device, terminal device control method, and terminal device control program Dec 18, 2019
B 6614677 Automatic change machine and control method thereof Dec 4, 2019
B 6614683 Wireless communication device and wireless antenna determination method Dec 4, 2019

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6624637 6624640 6624647 6624649 6624650 6624657 6625836 6626049 6621144 6621146 6621151 6621153 6621157 6614677 6614683

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Patent Ranking in Japan

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特許業務法人 広江アソシエイツ特許事務所

〒500-8368 岐阜県 岐阜市 宇佐3丁目4番3号 4-3,Usa 3-Chome, Gifu-City, 500-8368 JAPAN 特許・実用新案 意匠 商標 外国特許 外国商標 訴訟 鑑定 コンサルティング 

特許業務法人　湘洋内外特許事務所

〒220-0004 横浜市西区北幸２－１５－１ 東武横浜第２ビル６階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

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〒243-0021 神奈川県厚木市岡田３０５０ 厚木アクストメインタワー３階Ｂ－１ 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

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