Patent Ranking in Japan - Applicant details - Japanese version

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Applied Materials Incorporated

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  2017 Application Ranking      207th  publications: 254 下降2016: 200th  217)

  2017 Acquisition Ranking      227th  registrations: 136 上昇2016: 268th  121)

(update:Sep 21, 2023)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6254098 Methods and equipment for selective oxidation of substrates Dec 27, 2017
B 6254180 Board handling robots, systems and methods with controlled vibration Dec 27, 2017
B 6250540 Thin film structures and devices with integrated light and heat shield layers for laser patterning Dec 20, 2017
B 6250704 Shutter disc with fins for substrate process chamber Dec 20, 2017
B 6250724 Methods and equipment for aligning cassettes Dec 20, 2017
B 6248033 Hybrid laser plasma etching wafer dicing using a substrate carrier Dec 13, 2017
B 6242861 Optical system that controls the light transmitted through the conical quartz dome Dec 6, 2017
B 6243530 Positioning device for moving the board Dec 6, 2017
B 6238253 High frequency return device and plasma processing system for plasma processing chamber Nov 29, 2017
B 6238288 Sedimentation equipment and methods to reduce sedimentation asymmetry Nov 29, 2017
B 6238373 Crystallization for semiconductor applications Nov 29, 2017
B 6238963 Process kit shield and physical vapor deposition chamber with process kit shield Nov 29, 2017
B 6239559 Equipment and methods for improving the cool-down of radiantly heated substrates Nov 29, 2017
B 6240607 Gas delivery and distribution for uniform processes in linear large area plasma reactors Nov 29, 2017
B 6234438 Adaptation of optical model to measurement spectrum using diffraction effect Nov 22, 2017

1-15 (total:136)

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6254098 6254180 6250540 6250704 6250724 6248033 6242861 6243530 6238253 6238288 6238373 6238963 6239559 6240607 6234438

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