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Applied Materials Incorporated

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  2018 Application Ranking      172th  publications: 256 上昇2017: 207th  254)

  2018 Acquisition Ranking      188th  registrations: 158 上昇2017: 227th  136)

(update:Mar 3, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2018-538152 Apparatus and method for forming an abrasive article having a desired zeta potential Dec 27, 2018
2018-538429 Measuring assembly for measuring deposition rate, evaporation source, deposition apparatus and method therefor Dec 27, 2018
2018-538430 Method of operating a deposition apparatus, method of depositing evaporated source material on a substrate, and deposition apparatus Dec 27, 2018
2018-538518 Particle monitoring device Dec 27, 2018
2018-538629 Method and apparatus for interactively and dynamically updating schematic overlays Dec 27, 2018
2018-537580 Advanced coating methods and materials for preventing arcing in HDP-CVD chambers Dec 20, 2018
2018-537586 Carrier for flexible substrates Dec 20, 2018
2018-537849 System and method for low resistance physical vapor deposition of tungsten films Dec 20, 2018
2018-537853 Wafer point-by-point analysis and data presentation Dec 20, 2018
A 2018-199863 Method of forming tungsten pillar Dec 20, 2018
A 2018-201004 Detector for low temperature transmission high temperature measurement Dec 20, 2018
A 2018-201027 Pedestal with multi-zone temperature control and multi-purging function Dec 20, 2018
A 2018-201031 Processing chamber for etching low K and other dielectric films Dec 20, 2018
2018-536768 System configured for sputter deposition on a substrate, shield apparatus for a sputter deposition chamber, and method for providing an electrical shield within a sputter deposition chamber Dec 13, 2018
2018-536981 Methods for atomic resolution and plasma processing control Dec 13, 2018

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2018-538152 2018-538429 2018-538430 2018-538518 2018-538629 2018-537580 2018-537586 2018-537849 2018-537853 2018-199863 2018-201004 2018-201027 2018-201031 2018-536768 2018-536981

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Patent Ranking in Japan

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