Patent Ranking in Japan - Applicant details - Japanese version

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Semiconductor Energy Laboratory Co., Ltd.

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  2015 Application Ranking      28th  publications: 1336 上昇2014: 31th  1093)

  2015 Acquisition Ranking      25th  registrations: 1030 上昇2014: 32th  1102)

(update:Feb 25, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 5836132 Method for manufacturing semiconductor device Dec 24, 2015
B 5836447 Semiconductor device, display module, and electronic device Dec 24, 2015
B 5836449 Semiconductor device Dec 24, 2015
B 5836552 Semiconductor device Dec 24, 2015
B 5836557 Shift register and display device Dec 24, 2015
B 5836560 Semiconductor device Dec 24, 2015
B 5836615 Power storage device Dec 24, 2015
B 5836680 Semiconductor device and manufacturing method thereof Dec 24, 2015
B 5836846 Liquid crystal display device manufacturing method Dec 24, 2015
B 5837125 Quinoxaline derivative Dec 24, 2015
B 5837393 Semiconductor device Dec 24, 2015
B 5838051 Semiconductor device Dec 24, 2015
B 5838059 Electronic device and manufacturing method thereof Dec 24, 2015
B 5838062 Micro needle-like structure Dec 24, 2015
B 5832181 Liquid crystal display Dec 16, 2015

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5836132 5836447 5836449 5836552 5836557 5836560 5836615 5836680 5836846 5837125 5837393 5838051 5838059 5838062 5832181

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Patent Ranking in Japan

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和(なごみ)特許事務所

〒550-0005 大阪市西区西本町1-8-11 カクタスビル6F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

あいわ特許業務法人(特許事務所)

〒104-0045 東京都中央区築地1-12-22 コンワビル4F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

福井特許事務所

〒166-0003 東京都杉並区高円寺南2-50-2 YSビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング