Patent Ranking in Japan - Applicant details - Japanese version

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Kyocera Corporation

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  2018 Application Ranking      24th  publications: 1317 下降2017: 23th  1811)

  2018 Acquisition Ranking      22th  registrations: 1022 下降2017: 18th  1327)

(update:Dec 2, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6443977 Liquid crystal display Dec 26, 2018
B 6444801 Method for manufacturing low thermal expansion substrate Dec 26, 2018
B 6445152 Elastic wave resonator, elastic wave filter, duplexer, and communication device Dec 26, 2018
B 6445164 Liquid ejection head and recording apparatus using the same Dec 26, 2018
B 6445575 Base station and wireless terminal Dec 26, 2018
B 6445659 Power management device, power management system, and power management method Dec 26, 2018
B 6445750 Mobile terminal device, program, and method for controlling mobile terminal device Dec 26, 2018
B 6446157 Communication device, communication method, and communication system Dec 26, 2018
B 6446279 COMPOSITE STRUCTURE, ELECTRONIC DEVICE HAVING THE SAME, AND METHOD FOR MANUFACTURING COMPOSITE STRUCTURE Dec 26, 2018
B 6446375 Mobile communication system and user terminal Dec 26, 2018
B 6446553 Wireless terminal, processor and method Dec 26, 2018
B 6446562 Base station and wireless terminal Dec 26, 2018
B 6441264 Communication control method, user terminal, base station, and processor Dec 19, 2018
B 6441512 Wireless terminal and method Dec 19, 2018
B 6441583 Dielectric film and film capacitor Dec 19, 2018

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6443977 6444801 6445152 6445164 6445575 6445659 6445750 6446157 6446279 6446375 6446553 6446562 6441264 6441512 6441583

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Patent Ranking in Japan

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12月6日(火) - 東京 港区

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天城国際特許事務所

神奈川県川崎市堀川町580番地 ソリッドスクエアビル 東館 4階 特許・実用新案 意匠 商標 外国特許 訴訟 鑑定 コンサルティング