Patent Ranking in Japan - Applicant details - Japanese version

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National Institute of Advanced Industrial Science and Technology

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  2021 Application Ranking      94th  publications: 79 上昇2020: 121th  344)

  2021 Acquisition Ranking      103th  registrations: 48 下降2020: 90th  304)

(update:Mar 4, 2021)

2011  2012  2013  2014  2015  2016  2017  2018  2019  2020 

Publication numberTitle of the InventionPublic. dateRemarks
B 6837649 Information processing equipment, control methods, and programs Mar 3, 2021
B 6835326 Heteroreptic iridium complex, and light emitting materials and organic light emitting devices using the compound. Feb 24, 2021
B 6829805 High-precision mutual separation method for rare earth ions Feb 17, 2021
B 6829831 Resistive random access memory Feb 17, 2021
B 6830598 Power supply system and control method of power supply system Feb 17, 2021
B 6830627 Semiconductor devices and methods for manufacturing semiconductor devices Feb 17, 2021
B 6831398 Field flow fractionation device Feb 17, 2021
B 6831512 Silver microsphere and its manufacturing method Feb 17, 2021
B 6831517 How to make electrodes Feb 17, 2021
B 6831534 Composite particles, composite materials, and methods for producing composite particles Feb 17, 2021
B 6827242 Method for producing oxaloacetate using Halomonas Feb 10, 2021
B 6827581 PCR reaction vessel, PCR device and PCR method Feb 10, 2021
B 6828908 Ultrasonic therapy system Feb 10, 2021
B 6829358 Deformation sensor Feb 10, 2021
B 6829365 Pressure sensors, pressure sensor manufacturing methods, bed devices and automotive seats Feb 10, 2021

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6837649 6835326 6829805 6829831 6830598 6830627 6831398 6831512 6831517 6831534 6827242 6827581 6828908 6829358 6829365

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Patent Ranking in Japan

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リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

溝上法律特許事務所

大阪府大阪市西区靱本町1丁目10番4号 本町井出ビル2F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

北大阪特許事務所

〒564-0051 大阪府吹田市豊津町1番18号 エクラート江坂ビル4F 特許・実用新案 意匠 商標 外国特許 鑑定 コンサルティング