Patent Ranking in Japan - Applicant details - Japanese version

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National Institute of Advanced Industrial Science and Technology

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  2013 Application Ranking      93th  publications: 501 下降2012: 83th  517)

  2013 Acquisition Ranking      42th  registrations: 832 下降2012: 31th  960)

(update:May 6, 2021)

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公報番号発明の名称公報発行日備考
特許 5376280 Method and apparatus for producing simulated reformed gas and fuel cell test apparatus using the same Dec 25, 2013 共同出願
特許 5376465 Congestion situation prediction program, computer readable recording medium recording the congestion situation prediction program and congestion situation prediction apparatus, navigation program, computer readable recording medium recording the navigation program, and navigation apparatus Dec 25, 2013
特許 5376565 Photoresponsive liquid crystal material Dec 25, 2013
特許 5376357 Method for producing linear alkane by hydrogenation and ring opening of HMF with supercritical carbon dioxide fluid Dec 25, 2013
特許 5376506 Metallic glass body in which spherical primary crystals having ductility are uniformly dispersed, and method for producing the same Dec 25, 2013
特許 5376507 Magnesium alloy sheet having excellent cold formability and method for producing the same Dec 25, 2013
特許 5376508 High strength magnesium alloy sheet having excellent cold formability and method for producing the same Dec 25, 2013
特許 5376526 Spinning method and device Dec 25, 2013
特許 5376222 Ethanol steam reforming catalyst Dec 25, 2013
特許 5376527 Catalyst for electrochemical oxidation of alcohol Dec 25, 2013
特許 5376534 Method for producing plant with stress tolerance and use thereof Dec 25, 2013 共同出願
特許 5370711 Thermal lens forming element Dec 18, 2013 共同出願
特許 5371014 Method for producing particle number standard solution Dec 18, 2013
特許 5371015 Crossmark detectors and methods, and programs Dec 18, 2013
特許 5371011 Novel nano particle light emitter Dec 18, 2013

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5376280 5376465 5376565 5376357 5376506 5376507 5376508 5376526 5376222 5376527 5376534 5370711 5371014 5371015 5371011

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Patent Ranking in Japan

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リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

田中特許事務所

静岡県静岡市葵区紺屋町11−1ガーデンスクエアビル9F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

ひので総合特許事務所

〒330-0846 埼玉県さいたま市大宮区大門町3-205 ABCビル401 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング