Patent Ranking in Japan - Applicant details - Japanese version

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National Institute of Advanced Industrial Science and Technology

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  2018 Application Ranking      100th  publications: 418 上昇2017: 104th  498)

  2018 Acquisition Ranking      105th  registrations: 298 下降2017: 80th  372)

(update:Feb 25, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2017-145706 Bending method for thin film member Dec 27, 2018
2017-146132 Heat dissipation board Dec 27, 2018
2017-150577 Magnesium secondary battery and non-aqueous electrolyte for magnesium secondary battery Dec 27, 2018
2017-150617 Semiconductor-insulator reversible change thin film and method for manufacturing the same Dec 27, 2018
A 2018-201341 Insect accretion control method Dec 27, 2018
A 2018-201657 Respiratory sensor Dec 27, 2018
A 2018-201815 Catheter and manufacturing method thereof Dec 27, 2018
A 2018-202304 Method for producing zeolite catalyst Dec 27, 2018
A 2018-202314 Antimony separation and recovery method Dec 27, 2018
A 2018-202327 Metal-centered porphyrin-carbon complex Dec 27, 2018
A 2018-202506 Three-dimensional structure substrate manufacturing method Dec 27, 2018
A 2018-202508 Three-dimensional structure substrate manufacturing method Dec 27, 2018
A 2018-203901 Coke production method Dec 27, 2018
A 2018-203936 Coating liquid for forming light emitting film, method for preparing the same, and method for manufacturing light emitting film Dec 27, 2018
A 2018-203956 Yellow inorganic pigment and method for producing the same Dec 27, 2018

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2017-145706 2017-146132 2017-150577 2017-150617 2018-201341 2018-201657 2018-201815 2018-202304 2018-202314 2018-202327 2018-202506 2018-202508 2018-203901 2018-203936 2018-203956

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Patent Ranking in Japan

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あいだ特許事務所

〒195-0074 東京都町田市山崎町1089-10 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング 

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兵庫県西宮市高木西町18番5号 特許・実用新案 意匠 商標 外国特許 訴訟 コンサルティング 

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新潟県新潟市東区新松崎3-22-15 ラフィネドミールⅡ-102 特許・実用新案 意匠 商標 訴訟