Patent Ranking in Japan - Applicant details - Japanese version

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National Institute of Advanced Industrial Science and Technology

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  2019 Application Ranking      96th  publications: 444 上昇2018: 100th  418)

  2019 Acquisition Ranking      104th  registrations: 272 上昇2018: 105th  298)

(update:Nov 26, 2020)

2011  2012  2013  2014  2015  2016  2017  2018  2020 

Publication numberTitle of the InventionPublic. dateRemarks
A 2019-217530 Bonding substrate manufacturing method and bonding substrate Dec 26, 2019
A 2019-218218 Carbon nanomaterial processing method Dec 26, 2019
A 2019-218260 Mixed particles, slurries containing mixed particles, and composites Dec 26, 2019
A 2019-218285 Method for producing fluorine compound Dec 26, 2019
A 2019-218287 Method for producing fluorine compound Dec 26, 2019
A 2019-218305 Process for producing silanes having alkoxy group and acyloxy group, novel silanes, and uses thereof Dec 26, 2019
A 2019-218630 Method for recovering components to be recovered, perovskite-type composite oxide, and apparatus for continuously producing treated body Dec 26, 2019
A 2019-219226 Sensor device Dec 26, 2019
A 2019-219317 Vitamin concentration measurement method Dec 26, 2019
A 2019-219756 Control device, control method, program, and information recording medium Dec 26, 2019
A 2019-219813 Information processing method, system and program Dec 26, 2019
A 2019-220750 Electromagnetic wave suppression device and electromagnetic wave suppression method Dec 26, 2019
2018-155033 Oxide semiconductor and semiconductor device Dec 19, 2019
2018-155034 Oxide semiconductor and semiconductor device Dec 19, 2019
2018-159756 Sequence-controlled oligosiloxanes, methods for producing them, and oligosiloxane synthesizers Dec 19, 2019

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2019-217530 2019-218218 2019-218260 2019-218285 2019-218287 2019-218305 2019-218630 2019-219226 2019-219317 2019-219756 2019-219813 2019-220750 2018-155033 2018-155034 2018-159756

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Patent Ranking in Japan

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