Patent Ranking in Japan - Applicant details - Japanese version

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National Institute of Advanced Industrial Science and Technology

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  2021 Application Ranking      91th  publications: 67 上昇2020: 121th  344)

  2021 Acquisition Ranking      95th  registrations: 48 下降2020: 90th  304)

(update:Feb 25, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2019-168165 Current-voltage characteristic estimation method, device and program of photoelectric conversion element, and characteristic estimation device Feb 25, 2021
2020-54466 Fine particle observation device and fine particle observation method Feb 25, 2021
A 2021-27830 Reaction processing equipment and reaction processing method Feb 25, 2021
A 2021-27917 Information processing equipment, information processing systems, and machine learning equipment Feb 25, 2021
A 2021-28612 Semiconductor device measuring methods, semiconductor device measuring devices, and programs Feb 25, 2021
A 2021-28686 Resonator length adjuster Feb 25, 2021
A 2021-28733 Object identification device and object identification system Feb 25, 2021
A 2021-28982 Conductive compositions, thermoelectric conversion materials, and thermoelectric conversion elements Feb 25, 2021
A 2021-23894 High-speed dismantling device Feb 22, 2021
A 2021-25455 Wind turbine generators, control methods, and control programs that can control the pitch angle of the blades of the wind turbine. Feb 22, 2021
A 2021-25930 Target substance detector Feb 22, 2021
A 2021-25935 Evaluation method of materials by transient electron affinity and materials such as catalysts Feb 22, 2021
A 2021-27061 Thermoelectric conversion module Feb 22, 2021
A 2021-27097 Transient heat measurement method and its equipment Feb 22, 2021
A 2021-27106 Silicon Carbide epitaxial substrate and method for manufacturing silicon carbide epitaxial substrate Feb 22, 2021

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2019-168165 2020-54466 2021-27830 2021-27917 2021-28612 2021-28686 2021-28733 2021-28982 2021-23894 2021-25455 2021-25930 2021-25935 2021-27061 2021-27097 2021-27106

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Patent Ranking in Japan

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Applicant Search (Japanese only)

特許事務所紹介 IP Force 特許事務所紹介

エヌワン特許商標事務所

〒243-0021 神奈川県厚木市岡田3050 厚木アクストメインタワー3階B-1 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

角田特許事務所

〒130-0022 東京都墨田区江東橋4-24-5 協新ビル402 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

藤田特許商標事務所

〒104-0061 東京都中央区銀座1-8-2 銀座プルミエビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング