Patent Ranking in Japan - Applicant details - Japanese version

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FUJIFILM Corporation

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  2021 Application Ranking      12th  publications: 588 上昇2020: 21th  1338)

  2021 Acquisition Ranking      12th  registrations: 399 上昇2020: 16th  1148)

(update:Apr 22, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6860681 Manufacturing method of all-solid-state secondary battery, exterior material for all-solid-state secondary battery and all-solid-state secondary battery Apr 21, 2021
B 6860702 Endoscope Apr 21, 2021
B 6861139 Serotonin metabolism inhibitors, food and drink compositions, and pharmaceuticals Apr 21, 2021
B 6861182 Optical film manufacturing method Apr 21, 2021
B 6861284 Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device Apr 21, 2021
B 6861321 Radiation imaging device Apr 21, 2021
B 6861793 Manufacturing method of reflective layer Apr 21, 2021
B 6861811 Photocurable ink composition and image forming method Apr 21, 2021
B 6861842 Observation device and method and observation device control program Apr 21, 2021
B 6861865 Non-contact communication media, magnetic tape cartridges, non-contact communication media operating methods, and programs Apr 21, 2021
B 6861888 Radiation imaging device Apr 21, 2021
B 6864080 Laminates, building materials, window materials and radiative cooling equipment Apr 21, 2021
B 6864092 Radiation image detector and its operation method Apr 21, 2021
B 6864115 Microscope equipment and programs Apr 21, 2021
B 6856761 Focus control method for the image pickup device, the image pickup device body, and the image pickup device Apr 14, 2021

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6860681 6860702 6861139 6861182 6861284 6861321 6861793 6861811 6861842 6861865 6861888 6864080 6864092 6864115 6856761

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Patent Ranking in Japan

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名古屋国際特許業務法人

〒460-0003 愛知県名古屋市中区錦1-20-19 名神ビル2F 〒107-0052 東京都港区赤坂2-2-21 永田町法曹ビル9F(東京支店) 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

オーブ国際特許事務所(東京都)-ソフトウェア・電気電子分野専門

東京都千代田区飯田橋3-3-11新生ビル5階 特許・実用新案 商標 外国特許 鑑定 

福井特許事務所

〒166-0003 東京都杉並区高円寺南2-50-2 YSビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング