Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2012 Application Ranking      80th  publications: 531 下降2011: 54th  677)

  2012 Acquisition Ranking      78th  registrations: 484 下降2011: 39th  754)

(update:Jul 29, 2021)

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公報番号発明の名称公報発行日備考
特許 5105407 Photomask blank, photomask, and method for manufacturing photomask Dec 26, 2012 共同出願
特許 5105816 Lens meter inspection method Dec 26, 2012
特許 5111143 Endoscope hood Dec 26, 2012
特許 5110859 Endoscope device Dec 26, 2012
特許 5108551 Multi-tone photomask and pattern transfer method using the same Dec 26, 2012
特許 5107359 Method and apparatus for evaluating progressive-power lens, and method for manufacturing progressive-power lens Dec 26, 2012
特許 5108898 Interface refraction adjusting lens (IRAL) Dec 26, 2012
特許 5107358 Lens evaluation method, lens evaluation device, lens manufacturing method, and lens characteristic display method Dec 26, 2012
特許 5100790 Method for manufacturing optical element Dec 19, 2012
特許 5102261 Method for manufacturing glass substrate for information recording medium Dec 19, 2012
特許 5100597 Method of manufacturing magnetic recording medium Dec 19, 2012
特許 5102912 Gray tone mask defect correction method, gray tone mask manufacturing method, and pattern transfer method Dec 19, 2012
特許 5097521 Photomask inspection apparatus, photomask inspection method, photomask manufacturing method for manufacturing liquid crystal device, and pattern transfer method Dec 12, 2012
特許 5094303 Manufacturing method of glass substrate for magnetic disk and magnetic disk Dec 12, 2012
特許 5097429 The tip of a sector scan type ultrasonic endoscope Dec 12, 2012

1-15 (total:484)

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5105407 5105816 5111143 5110859 5108551 5107359 5108898 5107358 5100790 5102261 5100597 5102912 5097521 5094303 5097429

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牛田特許商標事務所

東京都板橋区東新町1-50-1 特許・実用新案 意匠 商標 外国特許 

リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

溝上法律特許事務所

大阪府大阪市西区靱本町1丁目10番4号 本町井出ビル2F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング