Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2013 Application Ranking      99th  publications: 482 下降2012: 80th  531)

  2013 Acquisition Ranking      93th  registrations: 434 下降2012: 78th  484)

(update:Sep 16, 2021)

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公報番号発明の名称公報発行日備考
特許 5379461 Mask blank substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method Dec 25, 2013
特許 5377085 Endoscope Dec 25, 2013
特許 5377258 Structure of the tip of a squint endoscope Dec 25, 2013
特許 5377849 Magnetic disk glass substrate package, magnetic disk glass substrate packaging method, and magnetic disk manufacturing method Dec 25, 2013 共同出願
特許 5377881 Photomask blank manufacturing method and photomask manufacturing method Dec 25, 2013
特許 5377130 Endoscope Dec 25, 2013
特許 5374599 Photomask blank, photomask manufacturing method, and semiconductor device manufacturing method Dec 25, 2013
特許 5372455 Reflective mask blank, reflective mask, and manufacturing method thereof Dec 18, 2013
特許 5371183 Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk Dec 18, 2013 共同出願
特許 5373511 Method for manufacturing glass substrate for magnetic disk, glass substrate for magnetic disk and magnetic disk Dec 18, 2013 共同出願
特許 5371667 Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk Dec 18, 2013
特許 5372403 Multi-tone photomask and pattern transfer method Dec 18, 2013
特許 5369121 Eyeglass lens evaluation method, eyeglass lens design method, eyeglass lens manufacturing method, eyeglass lens manufacturing system, and eyeglass lens Dec 18, 2013
特許 5366575 Multiple models of endoscopes Dec 11, 2013
特許 5362771 Manufacturing method of glass substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure mask, manufacturing method of reflective mask blanks, and manufacturing method of reflective mask Dec 11, 2013

1-15 (total:434)

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5379461 5377085 5377258 5377849 5377881 5377130 5374599 5372455 5371183 5373511 5371667 5372403 5369121 5366575 5362771

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Patent Ranking in Japan

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〒103-0028 東京都中央区八重洲一丁目4番16号 東京建物八重洲ビル2階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

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いわさき特許・商標事務所 埼玉県戸田市

埼玉県戸田市上戸田3-13-13 ガレージプラザ戸田公園A-2 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング