Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2018 Application Ranking      204th  publications: 213 下降2017: 185th  291)

  2018 Acquisition Ranking      136th  registrations: 218 下降2017: 113th  286)

(update:Jul 29, 2021)

2011  2012  2013  2014  2015  2016  2017  2019  2020  2021 

Publication numberTitle of the InventionPublic. dateRemarks
B 6444021 Optical glass, optical glass blank, glass material for press molding, optical element, and manufacturing method thereof Dec 26, 2018
B 6444680 Substrate manufacturing method, multilayer reflective film coated substrate manufacturing method, mask blank manufacturing method, and transfer mask manufacturing method Dec 26, 2018
B 6446095 Substrate for producing patterned medium, patterned medium, and manufacturing method thereof Dec 26, 2018
B 6440996 Reflective mask blank and method of manufacturing the same, method of manufacturing reflective mask, and method of manufacturing semiconductor device Dec 19, 2018
B 6441012 Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method Dec 19, 2018
B 6437602 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method Dec 12, 2018
B 6433634 Electronic endoscope processor and electronic endoscope system Dec 5, 2018
B 6429354 Glass substrate polishing method, polishing liquid, glass substrate manufacturing method, magnetic disk glass substrate manufacturing method, and magnetic disk manufacturing method Nov 28, 2018
B 6430155 Mask blank, phase shift mask, phase shift mask manufacturing method, and semiconductor device manufacturing method Nov 28, 2018
B 6430585 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method Nov 28, 2018
B 6430666 Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor device Nov 28, 2018
B 6431543 Method for manufacturing magnetic disk substrate Nov 28, 2018
B 6425951 Reflective mask blank and method of manufacturing the same, method of manufacturing reflective mask, and method of manufacturing semiconductor device Nov 21, 2018
B 6426078 Magnetic disk glass substrate, glass substrate, magnetic disk glass substrate manufacturing method, and magnetic disk manufacturing method Nov 21, 2018
B 6427280 Correction data generation method and correction data generation device Nov 21, 2018

1-15 (total:218)

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6444021 6444680 6446095 6440996 6441012 6437602 6433634 6429354 6430155 6430585 6430666 6431543 6425951 6426078 6427280

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Patent Ranking in Japan

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特許事務所紹介 IP Force 特許事務所紹介

リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

富士国際特許事務所

【名古屋オフィス】 〒462-0002愛知県名古屋市中区丸の内2-10-30インテリジェント林ビル2階 【可児オフィス】 〒509-0203岐阜県可児市下恵土 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング 

特許業務法人IPアシスト特許事務所

〒060-0002 札幌市中央区北2条西3丁目1番地太陽生命札幌ビル7階 特許・実用新案 商標 外国特許 訴訟 鑑定 コンサルティング