Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2018 Application Ranking      204th  publications: 213 下降2017: 185th  291)

  2018 Acquisition Ranking      136th  registrations: 218 下降2017: 113th  286)

(update:Apr 15, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
A 2018-201748 Lens storage container Dec 27, 2018
A 2018-205350 Reflective mask blank, reflective mask manufacturing method, mask blank, mask manufacturing method, semiconductor device manufacturing method, resist removing apparatus, and resist removing method Dec 27, 2018
A 2018-205400 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method Dec 27, 2018
A 2018-205693 Photomask and display device manufacturing method Dec 27, 2018
A 2018-205769 Mask blank, transfer mask, and method for manufacturing semiconductor device Dec 27, 2018
2017-142095 Endoscope light source device and endoscope system Dec 20, 2018
A 2018-200743 Method for manufacturing glass substrate that is the base of glass substrate for magnetic disk, method for manufacturing glass substrate for magnetic disk, and fixed-abrasive whetstone Dec 20, 2018
2017-146021 Variable magnification optical system for endoscope, endoscope and endoscope system Dec 13, 2018
A 2018-196926 Polishing or grinding treatment carrier manufacturing method, polishing or grinding treatment carrier, and substrate manufacturing method Dec 13, 2018
A 2018-197171 Lens with hydrophilic antireflection film and method for producing the same Dec 13, 2018
A 2018-192273 Medical device stand Dec 6, 2018
A 2018-194569 Dustproof lens and manufacturing method thereof Dec 6, 2018
2017-204245 Substrate assembly and electronic endoscope system Nov 29, 2018
2018-97261 Glass substrate polishing method, glass substrate manufacturing method, magnetic disk glass substrate manufacturing method, magnetic disk manufacturing method, polishing liquid and cerium oxide reduction method Nov 29, 2018
A 2018-189997 Photomask substrate, photomask blank, photomask, method of manufacturing photomask substrate, method of manufacturing display device, method of handling photomask, and method of handling photomask substrate Nov 29, 2018

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2018-201748 2018-205350 2018-205400 2018-205693 2018-205769 2017-142095 2018-200743 2017-146021 2018-196926 2018-197171 2018-192273 2018-194569 2017-204245 2018-97261 2018-189997

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Patent Ranking in Japan

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