Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2018 Application Ranking      204th  publications: 213 下降2017: 185th  291)

  2018 Acquisition Ranking      136th  registrations: 218 下降2017: 113th  286)

(update:Jun 17, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6427355 Image signal generator and electronic endoscopy system Nov 21, 2018
B 6427356 Image signal generator and electronic endoscopy system Nov 21, 2018
B 6422873 Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography and its manufacturing method, and manufacturing method for semiconductor devices Nov 14, 2018
B 6423108 Multi-stage push button switch device and multi-stage push button switch device for endoscopes Nov 14, 2018
B 6423363 Mold for polishing glass optical element blank, manufacturing method for polishing glass optical element blank, and manufacturing method for optical element Nov 14, 2018
B 6423935 Manufacturing method of glass substrate for information recording medium and brush for polishing Nov 14, 2018
B 6418734 Endoscope device Nov 7, 2018
B 6419578 Manufacturing method of glass substrate for hard disk Nov 7, 2018
B 6420137 Substrate manufacturing method, mask blank manufacturing method and imprint mold manufacturing method Nov 7, 2018
B 6420260 Manufacturing method of magnetic disk substrate and manufacturing method of magnetic disk Nov 7, 2018
B 6420358 Endoscope system and evaluation value calculation device Nov 7, 2018
B 6420383 Glass substrate for mask blank, substrate with multilayer reflective film, mask blank and mask Nov 7, 2018
B 6420958 Imprint mold blank and imprint mold Nov 7, 2018
B 6420975 Resist sensitivity evaluation method, transfer mask manufacturing method, imprint mold manufacturing method, and resist-based substrate supply method Nov 7, 2018
B 6415768 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method Oct 31, 2018

16-30 (total:218)

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6427355 6427356 6422873 6423108 6423363 6423935 6418734 6419578 6420137 6420260 6420358 6420383 6420958 6420975 6415768

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Patent Ranking in Japan

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特許事務所紹介 IP Force 特許事務所紹介

いわさき特許・商標事務所 埼玉県戸田市

埼玉県戸田市上戸田3-13-13 ガレージプラザ戸田公園A-2 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

特許業務法人 矢野内外国特許事務所

大阪府大阪市中央区南本町二丁目2番9号 辰野南本町ビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

あいだ特許事務所

〒195-0074 東京都町田市山崎町1089-10 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング