Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2018 Application Ranking      204th  publications: 213 下降2017: 185th  291)

  2018 Acquisition Ranking      136th  registrations: 218 下降2017: 113th  286)

(update:Jun 18, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6411046 Mask blank substrate manufacturing method, mask blank manufacturing method, and transfer mask manufacturing method Oct 24, 2018
B 6411734 Mold for polishing glass optical element blank, and method for manufacturing glass optical element blank for polishing and optical element Oct 24, 2018
B 6411768 Image processing device Oct 24, 2018
B 6411816 Noise reduction device Oct 24, 2018
B 6412361 Imaging device for endoscopes Oct 24, 2018
B 6405118 Imaging device Oct 17, 2018
B 6407582 Substrate manufacturing method, substrate with multilayer reflective film manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and substrate processing equipment Oct 17, 2018
B 6408790 Reflective mask blank, reflective mask and its manufacturing method, and semiconductor device manufacturing method Oct 17, 2018
B 6401341 A method for manufacturing a substrate with a multilayer reflective film for EUV lithography, a reflective mask blank for EUV lithography, and a reflective mask for EUV lithography and a semiconductor device. Oct 10, 2018
B 6400221 Endoscope shape grasping system Oct 3, 2018
B 6400360 Substrate manufacturing method, mask blank substrate manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and substrate manufacturing equipment Oct 3, 2018
B 6400370 Substrate manufacturing method, mask blank substrate manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and substrate manufacturing equipment Oct 3, 2018
B 6400763 Manufacturing method for mask blanks, transfer masks and semiconductor devices Oct 3, 2018
B 6401166 Mask blank, mask blank manufacturing method and transfer mask manufacturing method Oct 3, 2018
B 6396118 Phase shift mask blank and its manufacturing method, and phase shift mask manufacturing method Sep 26, 2018

31-45 (total:218)

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6411046 6411734 6411768 6411816 6412361 6405118 6407582 6408790 6401341 6400221 6400360 6400370 6400763 6401166 6396118

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Patent Ranking in Japan

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