Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2018 Application Ranking      204th  publications: 213 下降2017: 185th  291)

  2018 Acquisition Ranking      136th  registrations: 218 下降2017: 113th  286)

(update:Sep 22, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6396611 Mask blank, phase shift mask manufacturing method, and semiconductor device manufacturing method Sep 26, 2018
B 6396622 Glass, press-molded glass materials, optic blanks, and optics Sep 26, 2018
B 6396946 Image processing equipment and electronic endoscopy system Sep 26, 2018
B 6396949 Endoscopic system for large intestine Sep 26, 2018
B 6397068 Manufacturing method of substrate with multilayer reflective film, manufacturing method of reflective mask blank, manufacturing method of reflective mask, manufacturing method of transmissive mask blank, manufacturing method of transmissive mask, manufacturing method of semiconductor device Sep 26, 2018
B 6397137 Shape detector for endoscopes Sep 26, 2018
B 6391495 Photomask, photomask set, photomask manufacturing method, and display device manufacturing method Sep 19, 2018
B 6392610 Manufacturing method for magnetic disk substrates Sep 19, 2018
B 6392634 Non-magnetic substrate manufacturing method and polishing equipment Sep 19, 2018
B 6388233 Manufacturing method of glass substrate which is the basis of glass substrate for magnetic disk, manufacturing method of glass substrate for magnetic disk and manufacturing method of magnetic disk Sep 12, 2018
B 6388841 Manufacturing method of reflective mask blank, reflective mask blank, manufacturing method of reflective mask and semiconductor device Sep 12, 2018
B 6389352 Endoscope system Sep 12, 2018
B 6389375 Mask blanks and transfer masks and their manufacturing methods Sep 12, 2018
B 6389377 Endoscope processor Sep 12, 2018
B 6389605 Endoscope device Sep 12, 2018

46-60 (total:218)

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6396611 6396622 6396946 6396949 6397068 6397137 6391495 6392610 6392634 6388233 6388841 6389352 6389375 6389377 6389605

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Patent Ranking in Japan

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あいだ特許事務所

〒195-0074 東京都町田市山崎町1089-10 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 鑑定 コンサルティング 

福井特許事務所

〒166-0003 東京都杉並区高円寺南2-50-2 YSビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

特許業務法人 藤本パートナーズ 株式会社ネットス 株式会社パトラ

大阪オフィス:大阪市中央区南船場1-15-14 堺筋稲畑ビル2F 5F 東京オフィス:東京都千代田区平河町1-1-8 麹町市原ビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング