Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2020 Application Ranking      260th  publications: 156 下降2019: 231th  195)

  2020 Acquisition Ranking      204th  registrations: 144 下降2019: 193th  139)

(update:Jul 29, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6803186 Manufacturing method of mask blank substrate, substrate with multilayer reflective film, mask blank, transfer mask and semiconductor device Dec 23, 2020
B 6803415 Circuit board fixed structure and light irradiation device equipped with this Dec 23, 2020
B 6800779 Manufacturing method of transfer mask and manufacturing method of semiconductor device Dec 16, 2020
B 6801096 An endoscope having an endoscope head and an Alvaran lever that can be inserted into and removed from the endoscope head. Dec 16, 2020
B 6802249 Circuit board support structure and light irradiation device equipped with this Dec 16, 2020
B 6797925 Electronic Endoscope Processor and Electronic Endoscope System Dec 9, 2020
B 6792901 Manufacturing method of reflective mask blank, reflective mask blank, manufacturing method of reflective mask, reflective mask, and manufacturing method of semiconductor device Dec 2, 2020
B 6792966 Connection structure for electronic endoscopy equipment Dec 2, 2020
B 6793119 Glass for magnetic recording medium substrate, magnetic recording medium substrate and magnetic recording medium Dec 2, 2020
B 6795694 Endoscope with covering Dec 2, 2020
B 6795695 Endoscope and cap Dec 2, 2020
B 6796199 An endoscope having an endoscope head and an alvaran lever that can be attached to the endoscope head. Dec 2, 2020
B 6789723 Position sensor for endoscope shape detection Nov 25, 2020
B 6789972 Manufacturing method for mask blank substrate, substrate with multilayer reflective film, reflective mask blank and reflective mask, and semiconductor device Nov 25, 2020
B 6792661 Imaging module and endoscope Nov 25, 2020

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6803186 6803415 6800779 6801096 6802249 6797925 6792901 6792966 6793119 6795694 6795695 6796199 6789723 6789972 6792661

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Patent Ranking in Japan

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Applicant Search (Japanese only)

特許事務所紹介 IP Force 特許事務所紹介

あいぎ法律事務所

〒450-0002 愛知県名古屋市中村区名駅三丁目13番24号 第一はせ川ビル6階 特許・実用新案 意匠 商標 訴訟 鑑定 コンサルティング 

特許業務法人 藤本パートナーズ 株式会社ネットス 株式会社パトラ

大阪オフィス:大阪市中央区南船場1-15-14 堺筋稲畑ビル2F 5F 東京オフィス:東京都千代田区平河町1-1-8 麹町市原ビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

特許業務法人 浅村特許事務所 (東京都品川区)

〒140-0002 東京都品川区東品川2丁目2番24号 天王洲セントラルタワー21F・22F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング