Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2021 Application Ranking      225th  publications: 137 上昇2020: 260th  156)

  2021 Acquisition Ranking      236th  registrations: 94 下降2020: 204th  144)

(update:Sep 27, 2021)

2011  2012  2013  2014  2015  2016  2017  2018  2019  2020 

Publication numberTitle of the InventionPublic. dateRemarks
A 2021-148928 Manufacturing method for substrates with multilayer reflective films, reflective mask blanks, reflective masks, and semiconductor devices Sep 27, 2021
A 2021-148929 Dust collection method for substrates with a dielectric layer and EUV exposure equipment Sep 27, 2021
A 2021-148968 Manufacturing method for mask blanks, transfer masks, and semiconductor devices Sep 27, 2021
A 2021-149032 Manufacturing method of mask blank and transfer mask Sep 27, 2021
A 2021-149092 Photomask blank, photomask manufacturing method and display device manufacturing method Sep 27, 2021
A 2021-149101 Manufacturing method of photomask and display device Sep 27, 2021
A 2021-141973 Endoscope processor, endoscope, endoscope system, information processing method, program and learning model generation method Sep 24, 2021
A 2021-144075 Reflective Mask Blanks and Reflective Masks, and Methods for Manufacturing Semiconductor Devices Sep 24, 2021
A 2021-144146 Photomask blank, photomask blank manufacturing method, photomask manufacturing method and display device manufacturing method Sep 24, 2021
A 2021-144237 A phase shift mask blank, a method for manufacturing a phase shift mask using the blank, and a method for manufacturing a display device. Sep 24, 2021

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2021-148928 2021-148929 2021-148968 2021-149032 2021-149092 2021-149101 2021-141973 2021-144075 2021-144146 2021-144237

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Patent Ranking in Japan

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〒106-6111 東京都港区六本木6丁目10番1号 六本木ヒルズ森タワー 11階 横浜駅前オフィス:  〒220-0004  神奈川県横浜市西区北幸1丁目11ー1 水信ビル 7階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

特許業務法人 牛木国際特許事務所 新潟オフィス

〒951-8152 新潟県新潟市中央区信濃町21番7号 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

いわさき特許・商標事務所 埼玉県戸田市

埼玉県戸田市上戸田3-13-13 ガレージプラザ戸田公園A-2 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング