Patent Ranking in Japan - Applicant details - Japanese version

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HOYA Corporation

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  2021 Application Ranking      225th  publications: 137 上昇2020: 260th  156)

  2021 Acquisition Ranking      236th  registrations: 94 下降2020: 204th  144)

(update:Sep 27, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
A 2021-148928 Manufacturing method for substrates with multilayer reflective films, reflective mask blanks, reflective masks, and semiconductor devices Sep 27, 2021
A 2021-148929 Dust collection method for substrates with a dielectric layer and EUV exposure equipment Sep 27, 2021
A 2021-148968 Manufacturing method for mask blanks, transfer masks, and semiconductor devices Sep 27, 2021
A 2021-149032 Manufacturing method of mask blank and transfer mask Sep 27, 2021
A 2021-149092 Photomask blank, photomask manufacturing method and display device manufacturing method Sep 27, 2021
A 2021-149101 Manufacturing method of photomask and display device Sep 27, 2021
A 2021-141973 Endoscope processor, endoscope, endoscope system, information processing method, program and learning model generation method Sep 24, 2021
A 2021-144075 Reflective Mask Blanks and Reflective Masks, and Methods for Manufacturing Semiconductor Devices Sep 24, 2021
A 2021-144146 Photomask blank, photomask blank manufacturing method, photomask manufacturing method and display device manufacturing method Sep 24, 2021
A 2021-144237 A phase shift mask blank, a method for manufacturing a phase shift mask using the blank, and a method for manufacturing a display device. Sep 24, 2021

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2021-148928 2021-148929 2021-148968 2021-149032 2021-149092 2021-149101 2021-141973 2021-144075 2021-144146 2021-144237

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Patent Ranking in Japan

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