Patent Ranking in Japan - Applicant details - Japanese version

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Hitachi High-Technologies Corporation

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  2017 Application Ranking      138th  publications: 386 上昇2016: 182th  243)

  2017 Acquisition Ranking      90th  registrations: 339 下降2016: 89th  360)

(update:Jan 11, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6253477 Plasma processing method Dec 27, 2017
B 6254060 Vertical movement stage for charged particle beam device and charged particle beam device Dec 27, 2017
B 6254445 Charged particle beam device Dec 27, 2017
B 6255152 Inspection equipment Dec 27, 2017
B 6255216 Electrochemical measuring device Dec 27, 2017
B 6255339 Automatic analyzer Dec 27, 2017
B 6255448 Device condition setting method for charged particle beam device and charged particle beam device Dec 27, 2017
B 6255494 Electron microscope and sample observation method Dec 27, 2017
B 6249626 Automatic analyzer Dec 20, 2017
B 6249653 Automatic analyzer Dec 20, 2017
B 6250105 Electrolyte analyzer and electrolyte analysis method Dec 20, 2017
B 6251525 Charged particle beam device Dec 20, 2017
B 6245848 Automatic analyzer Dec 13, 2017
B 6246393 Charged particle beam device, installation method Dec 13, 2017
B 6247064 Biomolecule measuring device Dec 13, 2017

1-15 (total:341)

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6253477 6254060 6254445 6255152 6255216 6255339 6255448 6255494 6249626 6249653 6250105 6251525 6245848 6246393 6247064

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