Patent Ranking in Japan - Applicant details - Japanese version

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Ricoh Company, Ltd

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  2017 Application Ranking      5th  publications: 3925 上昇2016: 6th  3717)

  2017 Acquisition Ranking      5th  registrations: 2419 上昇2016: 7th  2316)

(update:Mar 3, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
2016-152486 Display device, display control method, display control program, and display system Dec 28, 2017
2016-158393 Equipment, communication systems, programs Dec 28, 2017
A 2017-225722 Information processing device, program, image display system Dec 28, 2017
A 2017-225738 Discontinuous brush, brush unit, cleaning device and discontinuous brush manufacturing method Dec 28, 2017
A 2017-226083 Device for ejecting liquid and method for ejecting liquid Dec 28, 2017
A 2017-226104 Device for ejecting liquid Dec 28, 2017
A 2017-226140 Polylactic acid composition for three-dimensional modeling and method for producing three-dimensional model Dec 28, 2017
A 2017-226194 Drawer unit and image forming apparatus Dec 28, 2017
A 2017-226207 Mold, mold forming method, and casting method Dec 28, 2017
A 2017-226491 Sheet material conveying unit, sheet material conveying device and device for ejecting liquid Dec 28, 2017
A 2017-226500 Sheet material suction device and image forming apparatus Dec 28, 2017
A 2017-226522 Sheet material suction device and image forming apparatus Dec 28, 2017
A 2017-226531 Conveying object stacker for image forming apparatus and image forming apparatus Dec 28, 2017
A 2017-226544 Medium suction device, image forming system, and medium inspection system Dec 28, 2017
A 2017-226741 Ink, inkjet printing method, inkjet printing device, and printed matter Dec 28, 2017

1-15 (total:3930)

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2016-152486 2016-158393 2017-225722 2017-225738 2017-226083 2017-226104 2017-226140 2017-226194 2017-226207 2017-226491 2017-226500 2017-226522 2017-226531 2017-226544 2017-226741

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〒248-0006 神奈川県鎌倉市小町2-11-14 山中MRビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

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あいわ特許業務法人(特許事務所)

〒104-0045 東京都中央区築地1-12-22 コンワビル4F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング