Patent Ranking in Japan - Applicant details - Japanese version

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Hitachi Chemical Company, Ltd.

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  2017 Application Ranking      42th  publications: 952 上昇2016: 57th  653)

  2017 Acquisition Ranking      80th  registrations: 372 下降2016: 66th  432)

(update:Aug 12, 2022)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6213675 Lithium ion secondary battery Oct 18, 2017
B 6213687 Power storage unit Oct 18, 2017
B 6209845 Polishing liquid, polishing liquid set, and polishing method for substrate Oct 11, 2017
B 6209876 Film for temporary fixing, film sheet for temporary fixing, and method for manufacturing semiconductor device Oct 11, 2017
B 6209928 Optical semiconductor device, substrate for mounting optical semiconductor element, and thermosetting resin composition for light reflection Oct 11, 2017
B 6210060 Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing permanent mask resist Oct 11, 2017
B 6210166 Lithium ion battery Oct 11, 2017
B 6210575 Substrate for mounting optical semiconductor element and optical semiconductor device Oct 11, 2017
B 6210576 Substrate for mounting optical semiconductor element and optical semiconductor device Oct 11, 2017
B 6210577 Substrate for mounting optical semiconductor element and optical semiconductor device Oct 11, 2017
B 6205723 Porous material and porous sheet Oct 4, 2017
B 6205925 Photosensitive conductive film, conductive pattern forming method using the same, and conductive pattern substrate Oct 4, 2017
B 6205955 Semiconductor device manufacturing method and semiconductor device obtained by the manufacturing method Oct 4, 2017
B 6206028 Method of manufacturing conductive pattern, conductive pattern substrate provided with conductive pattern manufactured by the method, touch panel sensor including the conductive pattern substrate, and photosensitive conductive film Oct 4, 2017
B 6206491 Electrode forming composition, solar cell element and solar cell Oct 4, 2017

76-90 (total:379)

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6213675 6213687 6209845 6209876 6209928 6210060 6210166 6210575 6210576 6210577 6205723 6205925 6205955 6206028 6206491

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Patent Ranking in Japan

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あいわ特許業務法人(特許事務所)

〒104-0045 東京都中央区築地1-12-22 コンワビル4F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

角田特許事務所

〒130-0022 東京都墨田区江東橋4-24-5 協新ビル402 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

佐藤良博特許事務所

埼玉県久喜市久喜東6-2-46 パレ・ドール久喜2-203 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング