Patent Ranking in Japan - Applicant details - Japanese version

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DIC Corporation

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  2016 Application Ranking      113th  publications: 382 下降2015: 111th  412)

  2016 Acquisition Ranking      75th  registrations: 391 上昇2015: 88th  313)

(update:Dec 2, 2021)

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Publication numberTitle of the InventionPublic. dateRemarks
B 6024344 Method and apparatus for detecting viscosity of reaction solution and apparatus for generating reaction solution Nov 16, 2016
B 6024796 Cell culture substrate and cell culture method Nov 16, 2016
B 6024855 Composition and liquid crystal display device using the same Nov 16, 2016
B 6024950 Nematic liquid crystal composition and liquid crystal display device using the same Nov 16, 2016
B 6025008 Fluorine-containing thermally decomposable resin, resist composition, composition for color filter protective film, resist film and color filter protective film Nov 16, 2016
B 6025010 Active energy ray curable composition and film using the same Nov 16, 2016
B 6025011 Phenolic hydroxyl group-containing compound, composition containing the same, and cured film thereof Nov 16, 2016
B 6028584 Method for producing toner for developing electrostatic image Nov 16, 2016
B 6021877 Rubber composition and method for producing rubber composition Nov 9, 2016
B 6024004 Method for producing corneal cell and method for producing corneal cell sheet Nov 9, 2016
B 6024121 Cyanate ester resin, curable resin composition, cured product thereof, semiconductor sealing material, prepreg, circuit board, and build-up film Nov 9, 2016
B 6019595 Compound Nov 2, 2016
B 6019752 Conductive resin composition, electrophotographic transfer belt, and image forming apparatus Nov 2, 2016
B 6019942 Resin composition, fiber sizing agent and molded product Nov 2, 2016
B 6020541 Liquid crystal composition and liquid crystal display device using the same Nov 2, 2016

46-60 (total:402)

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6024344 6024796 6024855 6024950 6025008 6025010 6025011 6028584 6021877 6024004 6024121 6019595 6019752 6019942 6020541

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Patent Ranking in Japan

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特許事務所紹介 IP Force 特許事務所紹介

リード国際特許事務所

〒102-0072  東京都千代田区飯田橋4-1-1 飯田橋ISビル8階 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

康信国際特許事務所(北京康信知識産権代理有限責任公司)

Floor 16, Tower A, InDo Building, A48 Zhichun Road, Haidian District, Beijing 100098, P.R. China 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング 

将星国際特許事務所

〒248-0006 神奈川県鎌倉市小町2-11-14 山中MRビル3F 特許・実用新案 意匠 商標 外国特許 外国意匠 外国商標 訴訟 鑑定 コンサルティング